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Robert M. Wallace

Researcher at University of Texas at Dallas

Publications -  503
Citations -  41237

Robert M. Wallace is an academic researcher from University of Texas at Dallas. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Atomic layer deposition. The author has an hindex of 84, co-authored 499 publications receiving 37236 citations. Previous affiliations of Robert M. Wallace include Texas Instruments & University of Texas System.

Papers
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Journal ArticleDOI

Controllable growth of layered selenide and telluride heterostructures and superlattices using molecular beam epitaxy

TL;DR: In this article, the authors present several of the firsts: first growth of MoTe2 by MBE, MoSe2 on Bi2Se3 SLs, transition metal dichalcogenide (TMD) SLs and lateral junction between a quintuple atomic layer of Bi2Te3 and a triple atomic layer in MoTe 2.
Journal ArticleDOI

Frequency dispersion reduction and bond conversion on n-type GaAs by in situ surface oxide removal and passivation

TL;DR: The method of surface preparation on n-type GaAs, even with the presence of an amorphous-Si interfacial passivation layer, is shown to be a critical step in the removal of accumulation capacitance frequency dispersion as mentioned in this paper.
Patent

Fluorinated coating for an optical element

TL;DR: In this paper, a halogenated material is used to form a chemical bond with the surface of the window of an optically transmissive window, which has a coating on one or both of its surfaces.
Patent

Anode plate for flat panel display having integrated getter

TL;DR: In this article, the getter material for an anode plate in a field emission flat panel display device is described. And the methods of fabricating the getters are described.
Journal ArticleDOI

WSe2-contact metal interface chemistry and band alignment under high vacuum and ultra high vacuum deposition conditions

TL;DR: In this article, contact metals (Au, Ir, and Cr) are deposited on bulk WSe2 under UHV and HV conditions and subsequently characterized with x-ray photoelectron spectroscopy (XPS) to elucidate the effects of reactor base pressure on resulting interface chemistry and band alignment.