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An electrically pumped germanium laser

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TLDR
Electrically pumped lasing from Germanium-on-Silicon pnn heterojunction diode structures is demonstrated and a Germanium gain spectrum of nearly 200nm is observed.
Abstract
Electrically pumped lasing from Germanium-on-Silicon pnn heterojunction diode structures is demonstrated. Room temperature multimode laser with 1mW output power is measured. Phosphorous doping in Germanium at a concentration over 4x1019cm-3 is achieved. A Germanium gain spectrum of nearly 200nm is observed.

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Journal ArticleDOI

Extraction of carrier lifetime in Ge waveguides using pump probe spectroscopy

TL;DR: In this paper, the authors deduced the lifetimes of waveguides with varying Ge thickness and width using time-resolved infrared transmission pump-probe spectroscopy using a CW laser.
Journal ArticleDOI

Enhanced GeSn Microdisk Lasers Directly Released on Si

TL;DR: In this paper, a strain-free GeSn microdisk laser device fully released on Si outperforms the canonical suspended devices, allowing to simultaneously relax the limiting compressive strain while offering excellent thermal conduction.
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Theoretical analysis of optical gain in uniaxial tensile strained and n + -doped Ge/GeSi quantum well.

TL;DR: Simulation results show that the optical gain can be dramatically enhanced with the help of uniaxial tensile strain and n-type doping and consider the competition between gain and loss.
Journal ArticleDOI

Stacking of 2D Electron Gases in Ge Probed at the Atomic Level and Its Correlation to Low-Temperature Magnetotransport

TL;DR: It is found that at a separation of 9 nm the stacked-2DEGs, while interacting, still maintain their individuality in terms of electron transport and show long phase coherence lengths, resulting in an interlayer scattering time much longer than the scattering time within the dopant plane.
Journal ArticleDOI

Material Gain Analysis of GeSn/SiGeSn Quantum Wells for Mid-Infrared Si-Based Light Sources Based on Many-Body Theory

TL;DR: In this paper, the material gain of GeSn/SiGeSn quantum wells, which can be grown on Si substrate using a buffer layer, is analyzed based on microscopic many-body theory (MBT) for mid-infrared light sources based on Si photonics.
References
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Journal Article

Silicon photonics

TL;DR: The silicon chip has been the mainstay of the electronics industry for the last 40 years and has revolutionized the way the world operates as mentioned in this paper, however, any optical solution must be based on low-cost technologies if it is to be applied to the mass market.
Journal ArticleDOI

Ge-on-Si laser operating at room temperature.

TL;DR: What is believed to be the first experimental observation of lasing from the direct gap transition of Ge-on-Si at room temperature using an edge-emitting waveguide device is reported.
Journal ArticleDOI

Tensile-strained, n-type Ge as a gain medium for monolithic laser integration on Si

TL;DR: Results indicate that tensile strained n-type Ge is a good candidate for Si integrated lasers, despite of the free carrier absorption loss.
Journal ArticleDOI

Monolithic integration of room-temperature cw GaAs/AlGaAs lasers on Si substrates via relaxed graded GeSi buffer layers

TL;DR: In this article, a GaAs/AlxGa(1−x)As quantum well laser has been demonstrated via organometallic chemical vapor deposition on relaxed graded Ge/GeSi/Si virtual substrates on Si.
Journal ArticleDOI

Hybrid silicon evanescent laser fabricated with a silicon waveguide and III-V offset quantum wells.

TL;DR: A novel laser that utilizes a silicon waveguide bonded to AlGaInAs quantum wells is demonstrated that allows the optical waveguide to be defined by CMOS-compatible silicon processing while optical gain is provided by III-V materials.
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