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Showing papers on "Amorphous silicon published in 2017"


Journal ArticleDOI
TL;DR: The three major thin film solar cell technologies include amorphous silicon (α-Si), copper indium gallium selenide (CIGS), and cadmium telluride (cdTe).
Abstract: Thin film solar cells are favorable because of their minimum material usage and rising efficiencies. The three major thin film solar cell technologies include amorphous silicon (α-Si), copper indium gallium selenide (CIGS), and cadmium telluride (CdTe). In this paper, the evolution of each technology is discussed in both laboratory and commercial settings, and market share and reliability are equally explored. The module efficiencies of CIGS and CdTe technologies almost rival that of crystalline solar cells, which currently possess greater than 55% of the market share. α-Si is plagued with low efficiency and light-induced degradation, so it is almost extinct in terrestrial applications. CIGS and CdTe hold the greatest promise for the future of thin film. Longevity, reliability, consumer confidence and greater investments must be established before thin film solar cells are explored on building integrated photovoltaic systems.

640 citations


Journal ArticleDOI
TL;DR: A hybrid anode via incorporation of an implanted amorphous silicon nanolayer and edge-plane-activated graphite, which meets both criteria in improving lithium ion transport and minimizing initial capacity losses even with increase in energy density is demonstrated.
Abstract: As fast-charging lithium-ion batteries turn into increasingly important components in forthcoming applications, various strategies have been devoted to the development of high-rate anodes. However, despite vigorous efforts, the low initial Coulombic efficiency and poor volumetric energy density with insufficient electrode conditions remain critical challenges that have to be addressed. Herein, we demonstrate a hybrid anode via incorporation of a uniformly implanted amorphous silicon nanolayer and edge-site-activated graphite. This architecture succeeds in improving lithium ion transport and minimizing initial capacity losses even with increase in energy density. As a result, the hybrid anode exhibits an exceptional initial Coulombic efficiency (93.8%) and predominant fast-charging behavior with industrial electrode conditions. As a result, a full-cell demonstrates a higher energy density (≥1060 Wh l−1) without any trace of lithium plating at a harsh charging current density (10.2 mA cm−2) and 1.5 times faster charging than that of conventional graphite. It is desirable to develop fast-charging batteries retaining high energy density. Here, the authors report a hybrid anode via incorporation of an implanted amorphous silicon nanolayer and edge-plane-activated graphite, which meets both criteria.

242 citations


Journal ArticleDOI
TL;DR: A review of the state-of-the-art of a-Si:H solar cell technology from growth and characterization of single layers to full solar cells and multijunction devices is presented in this article.
Abstract: Hydrogenated amorphous silicon (a-Si:H) has been used for decades—doped and as intrinsic absorber layers—in thin-film silicon solar cells. Whereas their effiency was improved for a long time by the deposition of higher quality absorber layers, recent improvements can be attributed to a better understanding of the interfaces, allowing for their specific engineering. In this review, we briefly resume the state-of-the-art of a-Si:H solar cell technology from growth and characterization of single layers to full solar cells and multijunction devices. Focusing on the absorber layer quality first, we highlight thereafter aspects of interface problematics and discuss the growth and role of doped microcrystalline silicon-oxide layers and approaches of 3D-solar-cell designs in more detail. Although the findings summarized in this review were obtained from thin-film solar cells, we show that a-Si:H is a very versatile material with properties that are of high interest for application in other devices such as heterojunction solar cells, detectors, or optoelectronic devices.

128 citations


Journal ArticleDOI
TL;DR: In this article, the thermal resistance analysis of the photovoltaic-thermoelectric (PV-TE) hybrid system is proposed to optimize the design of the coupled system in terms of optimal total conversion efficiency.

103 citations


Journal ArticleDOI
TL;DR: An optimized silicon/carbon composite has been developed to further improve its electrochemical performance and lead to ultrafast reversible sodium insertion in the newly generated amorphous silicon.
Abstract: The electrochemical mechanism of nanocrystalline silicon anode in sodium ion batteries is first studied via in operando Raman and in operando X-ray diffraction. An irreversible structural conversion from crystalline silicon to amorphous silicon takes place during the initial cycles, leading to ultrafast reversible sodium insertion in the newly generated amorphous silicon. Furthermore, an optimized silicon/carbon composite has been developed to further improve its electrochemical performance.

102 citations


Journal ArticleDOI
TL;DR: In this article, vanadium suboxide (V2Ox) capped with a thin Ni layer was used as a hole transport layer trying to avoid both the intrinsic amorphous silicon layer and the TCO contact layer.
Abstract: Over the last few years, transition metal oxide layers have been proposed as selective contacts both for electrons and holes and successfully applied to silicon solar cells. However, better published results need the use of both a thin and high quality intrinsic amorphous Si layer and TCO (Transparent Conductive Oxide) films. In this work, we explore the use of vanadium suboxide (V2Ox) capped with a thin Ni layer as a hole transport layer trying to avoid both the intrinsic amorphous silicon layer and the TCO contact layer. Obtained figures of merit for Ni/V2Ox/c-Si(n) test samples are saturation current densities of 175 fA cm−2 and specific contact resistance below 115 mΩ cm2 on 40 nm thick V2Ox layers. Finally, the Ni/V2Ox stack is used with an interdigitated back-contacted c-Si(n) solar cell architecture fully fabricated at low temperatures. An open circuit voltage, a short circuit current and a fill factor of 656 mV, 40.7 mA cm−2 and 74.0% are achieved, respectively, leading to a power conversion efficiency of 19.7%. These results confirm the high potential of Ni/V2Ox stacks as hole-selective contacts on crystalline silicon photovoltaics.

90 citations


Journal ArticleDOI
TL;DR: In this paper, the authors comb the fields to elucidate the strategies towards high efficiency thin-film solar cells and provide pointers for further development, starting from the photoelectron generation, they look into the fundamental issues in photoelectric conversion processes.

85 citations


Journal ArticleDOI
TL;DR: In this paper, the importance of gettering and hydrogenation for next-generation silicon solar cells in the context of industrial cell fabrication is discussed, and a potential high-efficiency hybrid homojunction/heterojunction structure is discussed that could naturally enable gettingtering and bulk hydrogenation throughout cell fabrication.
Abstract: We discuss the importance of gettering and hydrogenation for next-generation silicon solar cells in the context of industrial cell fabrication. Gettering and hydrogenation play a vital role for p-type cell technologies in improving the silicon material's minority charge carrier lifetime. These mechanisms are naturally incorporated during screen-printed cell fabrication through the phosphorus emitter diffusion, silicon nitride deposition and subsequent metallisation firing processes. While the transition towards emitters with lower dopant concentrations and/or thermal oxide passivation can reduce surface recombination, it can negatively impact the ability to getter common impurities such as iron. For cell technologies with alternative low-temperature metallisation approaches, the ability to hydrogenate bulk defects is greatly reduced. Ultra-high efficiency n-type technologies tend to use heterojunction structures rather than diffused layers, but in doing so, do not benefit from phosphorus gettering. Also, particularly for amorphous silicon-based heterojunction structures, the imposed temperature constraints strongly limit the ability to passivate bulk defects. As a result, high-efficiency n-type technologies rely on the use of ‘high-quality’ wafers or would require the deliberate addition of gettering and hydrogenation processes before cell fabrication. A potential high-efficiency hybrid homojunction/heterojunction structure is then discussed that could naturally enable gettering and bulk hydrogenation throughout cell fabrication. Calibrated implied open circuit voltage (Voc) map of a p-type mono-crystalline wafer highlighting the impact of pre-hydrogenating the top half of the wafer.

67 citations


Journal ArticleDOI
TL;DR: In this article, the highly conductive polymer poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS) can successfully be applied as a hole selective front contact in silicon heterojunction (SHJ) solar cells.
Abstract: We show that the highly conductive polymer poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS) can successfully be applied as a hole selective front contact in silicon heterojunction (SHJ) solar cells. In combination with a superior electron selective heterojunction back contact based on amorphous silicon (a-Si), mono-crystalline n-type silicon (c-Si) solar cells reach power conversion efficiencies up to 14.8% and high open-circuit voltages exceeding 660 mV. Since in the PEDOT:PSS/c-Si/a-Si solar cell the inferior hybrid junction is determining the electrical device performance we are capable of assessing the recombination velocity (v I ) at the PEDOT:PSS/c-Si interface. An estimated v I of ~400 cm/s demonstrates, that while PEDOT:PSS shows an excellent selectivity on n-type c-Si, the passivation quality provided by the formation of a native oxide at the c-Si surface restricts the performance of the hybrid junction. Furthermore, by comparing the measured external quantum efficiency with optical simulations, we quantify the losses due to parasitic absorption of PEDOT:PSS and reflection of the device layer stack. By pointing out ways to better passivate the hybrid interface and to increase the photocurrent we discuss the full potential of PEDOT:PSS as a front contact in SHJ solar cells.

62 citations


Journal ArticleDOI
TL;DR: In this article, the authors provide experimental band offset values for a number of gate dielectrics on Indium-Gallium-Zinc Oxide (IGZO) for TFT backplane technologies.
Abstract: Thin-film transistors (TFTs) with channels made of hydrogenated amorphous silicon (a-Si:H) and polycrystalline silicon (poly-Si) are used extensively in the display industry. Amorphous silicon continues to dominate large-format display technology, but a-Si:H has a low electron mobility, μ ∼ 1 cm2/V s. Transparent, conducting metal-oxide materials such as Indium-Gallium-Zinc Oxide (IGZO) have demonstrated electron mobilities of 10–50 cm2/V s and are candidates to replace a-Si:H for TFT backplane technologies. The device performance depends strongly on the type of band alignment of the gate dielectric with the semiconductor channel material and on the band offsets. The factors that determine the conduction and valence band offsets for a given material system are not well understood. Predictions based on various models have historically been unreliable and band offset values must be determined experimentally. This paper provides experimental band offset values for a number of gate dielectrics on IGZO for nex...

62 citations


Journal ArticleDOI
TL;DR: In this article, a-Si:H/c-Si interface has been shown to increase the operating voltage and conversion efficiency during light exposure, and the performance increase is induced by injected charge carriers (either by light soaking or forwardvoltage biasing).

Journal ArticleDOI
TL;DR: In this paper, a two-dimensional finite-difference time-domain (FDTD) technique was used to analyze the superstrate (p-i-n) planar amorphous silicon solar cells and the front transparent contact layer was also inquired by using SnO2:F and ZnO:Al materials to improve photon absorption in the photoactive layer.
Abstract: Hydrogenated amorphous silicon (a-Si:H) has been effectively utilized as photoactive and doped layers for quite a while in thin-film solar applications but its energy conversion efficiency is limited due to thinner absorbing layer and light degradation issue. To overcome such confinements, it is expected to adjust better comprehension of device structure, material properties, and qualities since a little enhancement in the photocurrent significantly impacts on the conversion efficiency. Herein, some numerical simulations were performed to characterize and optimize different configuration of amorphous silicon-based thin-film solar cells. For the optical simulation, two-dimensional finite-difference time-domain (FDTD) technique was used to analyze the superstrate (p-i-n) planar amorphous silicon solar cells. Besides, the front transparent contact layer was also inquired by using SnO2:F and ZnO:Al materials to improve the photon absorption in the photoactive layer. The cell was studied for open-circuit voltage, external quantum efficiency, and short-circuit current density, which are building blocks for solar cell conversion efficiency. The optical simulations permit investigating optical losses at the individual layers. The enhancement in both short-circuit current density and open-circuit voltage prompts accomplishing more prominent power conversion efficiency. A maximum short-circuit current density of 15.32 mA/cm2 and an energy conversion efficiency of 11.3% were obtained for the optically optimized cell which is the best in class amorphous solar cell.

Patent
31 Mar 2017
TL;DR: In this article, a gap in a substrate may be filled with amorphous silicon by heating the substrate to a deposition temperature between 300 and 500°C and providing a feed gas that comprises a first silicon reactant to deposit an amorphized silicon film into the gap with an hydrogen concentration between 0.1 and 10 at.
Abstract: Amorphous silicon-filled gaps may be formed having no or a low occurrence of voids in the amorphous silicon fill, while maintaining a smooth exposed silicon surface. A gap in a substrate may be filled with amorphous silicon by heating the substrate to a deposition temperature between 300 and 500° C. and providing a feed gas that comprises a first silicon reactant to deposit an amorphous silicon film into the gap with an hydrogen concentration between 0.1 and 10 at. %. The deposited silicon film may subsequently be annealed. After the anneal, any voids may be reduced in size and this reduction in size may occur to such an extent that the voids may be eliminated.

Journal ArticleDOI
TL;DR: In this article, the effects of diamond grit size, wire speed, and number of slicing cycle on the surface roughness and subsurface damage of the workpiece were investigated by surface profiling, Raman spectroscopy and cross-sectional transmission electron microscopy.
Abstract: Single-crystal silicon was sliced using a newly developed high-speed fixed-abrasive dicing wire saw. The effects of diamond grit size, wire speed, and number of slicing cycle on the surface roughness and subsurface damage of the workpiece were investigated by surface profiling, Raman spectroscopy and cross-sectional transmission electron microscopy. It was found that by using finer diamond grits and increasing the sawing cycles, the depth of micro dents and saw marks was reduced significantly, and in turn, the surface roughness was improved. A transition from brittle mode to ductile mode machining was confirmed from chip morphology observation when reducing the grit size. The subsurface damaged layers were composed of amorphous layers, dislocated layers with grain boundaries, as well as micro cracks. The smooth surface regions were dominated by amorphous silicon; while within the saw marks, a mixture of amorphous and metastable silicon phases was detected. Inside the micro dents, however, single-crystal silicon was predominant. Furthermore, the significance of silicon amorphization and poly-crystallization was strongly dependent on the wire speed. The higher the wire speed, the less the amorphous and polycrystalline layer. The present study provides comprehensive insights into the surface formation mechanism which is important for process optimization of high-speed and low-damage slicing of single-crystal silicon.

Journal ArticleDOI
TL;DR: In this article, MoO x is chosen as the hole-selective layer of the silicon heterojunction solar cell to reduce the parasitic incident-light absorption, and the results demonstrate that the low-cost ZnO:B electronselective materials could allow realization of the optical and electrical requirements simultaneously, and also provide an alternative design concept for existing energy conversion devices.

Journal ArticleDOI
TL;DR: In this article, the intrinsic bipolar resistance switching in metaloxide-metal silicon oxide ReRAM devices was studied and it was shown that columnar growth, which results from sputter-deposition of the oxide on rough surfaces, enhances resistance switching behavior.

Journal ArticleDOI
02 Feb 2017-ACS Nano
TL;DR: In this paper, the authors used structures of a-Si nanotubes and suspended aSi films that enabled precise in-plane thermal conductivity (κ∥) measurement within a wide thickness range of 5 nm to 1.7 μm.
Abstract: Amorphous Si (a-Si) nanostructures are ubiquitous in numerous electronic and optoelectronic devices. Amorphous materials are considered to possess the lower limit to the thermal conductivity (κ), which is ∼1 W·m–1 K–1 for a-Si. However, recent work suggested that κ of micrometer-thick a-Si films can be greater than 3 W·m–1 K–1, which is contributed to by propagating vibrational modes, referred to as “propagons”. However, precise determination of κ in a-Si has been elusive. Here, we used structures of a-Si nanotubes and suspended a-Si films that enabled precise in-plane thermal conductivity (κ∥) measurement within a wide thickness range of 5 nm to 1.7 μm. We showed unexpectedly high κ∥ in a-Si nanostructures, reaching ∼3.0 and 5.3 W·m–1 K–1 at ∼100 nm and 1.7 μm, respectively. Furthermore, the measured κ∥ is significantly higher than the cross-plane κ on the same films. This unusually high and anisotropic thermal conductivity in the amorphous Si nanostructure manifests the surprisingly broad propagon mean ...

Journal ArticleDOI
TL;DR: In this article, the optoelectronic properties and microstructure of molybdenum oxide-based hole contacts are evaluated at different steps of the manufacturing process and shown that the changes in the contact properties result in a barrier that impedes hole transport when measuring I-V characteristics at room temperature.
Abstract: Molybdenum oxide is an efficient hole collector for silicon solar cells. However, its optoelectronic properties deteriorate during cell manufacturing. To assess this issue, the optoelectronic properties and microstructure of molybdenum oxide-based hole contacts are evaluated at different steps of the manufacturing process. Molybdenum oxide becomes more absorbing as it reduces when placed in contact with hydrogenated amorphous silicon, triggering the formation of a 2-nm thick SiO x layer, and when annealed after exposure to the plasma used to sputter the transparent conductive oxide. These changes in the contact properties result in a barrier that impedes hole transport when measuring I–V characteristics at room temperature. Nonetheless, cells still reach an efficiency of up to 20.7% when using a front metal electrode screen-printed at 210 °C (21.7% for reference cells). Above 60 °C, both molybdenum oxide-based and reference cells exhibit the same efficiency as this barrier to hole transport vanishes.

Journal ArticleDOI
TL;DR: In this paper, the authors proposed an approach to realize highly ordered metal oxide nanopatterns on polyimide (PI) substrate based on the sol-gel chemistry and soft thermal nanoimprinting lithography.
Abstract: The mechanical flexibility of substrates and controllable nanostructures are two major considerations in designing high-performance, flexible thin-film solar cells. In this work, we proposed an approach to realize highly ordered metal oxide nanopatterns on polyimide (PI) substrate based on the sol-gel chemistry and soft thermal nanoimprinting lithography. Thin-film amorphous silicon (a-Si:H) solar cells were subsequently constructed on the patterned PI flexible substrates. The periodic nanopatterns delivered broadband-enhanced light absorption and quantum efficiency, as well as the eventual power conversion efficiency (PCE). The nanotextures also benefit for the device yield and mechanical flexibility, which experienced little efficiency drop even after 100,000 bending cycles. In addition, flexible, transparent nanocone films, obtained by a template process, were attached onto the patterned PI solar cells, serving as top anti-reflection layers. The PCE performance with these dual-interfacial patterns rose up to 8.17%, that is, it improved by 48.5% over the planar device. Although the work was conducted on a-Si:H material, our proposed scheme can be extended to a variety of active materials for different optoelectronic applications.

Journal ArticleDOI
TL;DR: In this paper, the effect of the nc-Si:H deposition conditions and film growth on the intrinsic hydrogenated amorphous silicon passivation layer ((i)a-Si-H) underneath was investigated.
Abstract: We investigated hydrogenated nanocrystalline silicon (nc-Si:H) films as doped emitter layers for silicon heterojunction solar cells. Firstly, we focused on the effect of the nc-Si:H deposition conditions and film growth on the intrinsic hydrogenated amorphous silicon passivation layer ((i)a-Si:H) underneath. Three different p-doped emitters were compared: nc-Si:H, nc-SiOx:H, and a-Si:H. We found that the nc-Si:H and nc-SiOx:H growth enhances the passivation of the epitaxy-free (i)a-Si:H layer, yielding implied open circuit voltages above 730 mV. Secondly, for (p)nc-Si:H emitters, we observed a trade-off between fill factor (FF) and open circuit voltage (Voc) by using two types of (i)a-Si:H films. A slight epitaxy of the (i)layer seems to promote the rapid nucleation of nc-Si:H, thereby positively affecting the FF (79.5%) and series resistance but reducing Voc (670 mV). Contrarily, on well-passivating (i)a-Si:H the nc-Si:H nucleation is more difficult resulting in S-shaped I–V curves, presumably due to low built-in voltage and a poor emitter/TCO contact. To circumvent this dilemma, a CO2 plasma treatment is used to oxidize the a-Si:H surface before the nc-Si:H emitter deposition thereby enhancing nucleation. Accordingly, a FF of 74.5% with Voc of 727 mV is reached in the best device, yielding a conversion efficiency of 21%. HR-TEM micrograph of the front layer stack of the solar cell. The image shows a region close to the valley between two pyramids. From bottom to top: c-Si substrate, (i)a-Si:H passivation layer showing epitaxially grown regions, (p)nc-Si:H emitter layer, and In2O3:Sn (ITO). Yellow lines highlight layers and individual crystals. Silicon zone axis orientation is .

Journal ArticleDOI
TL;DR: Silicon carbide devices are a promising technology that may accelerate clinical translation in neural engineering by enabling truly chronic applications and have outstanding chemical stability, is biocompatible, is an excellent molecular barrier and is compatible with standard microfabrication processes.
Abstract: Objective. Current neural probes have a limited device lifetime of a few years. Their common failure mode is the degradation of insulating films and/or the delamination of the conductor–insulator interfaces. We sought to develop a technology that does not suffer from such limitations and would be suitable for chronic applications with very long device lifetimes. Approach. We developed a fabrication method that integrates polycrystalline conductive silicon carbide with insulating silicon carbide. The technology employs amorphous silicon carbide as the insulator and conductive silicon carbide at the recording sites, resulting in a seamless transition between doped and amorphous regions of the same material, eliminating heterogeneous interfaces prone to delamination. Silicon carbide has outstanding chemical stability, is biocompatible, is an excellent molecular barrier and is compatible with standard microfabrication processes. Main results. We have fabricated silicon carbide electrode arrays using our novel fabrication method. We conducted in vivo experiments in which electrocorticography recordings from the primary visual cortex of a rat were obtained and were of similar quality to those of polymer based electrocorticography arrays. The silicon carbide electrode arrays were also used as a cuff electrode wrapped around the sciatic nerve of a rat to record the nerve response to electrical stimulation. Finally, we demonstrated the outstanding long term stability of our insulating silicon carbide films through accelerated aging tests. Significance. Clinical translation in neural engineering has been slowed in part due to the poor long term performance of current probes. Silicon carbide devices are a promising technology that may accelerate this transition by enabling truly chronic applications.

Journal ArticleDOI
TL;DR: An unexpected regime of fast diffusion immediately after photoexcitation is observed, together with spontaneous electron-hole separation and charge trapping induced by the atomic disorder in hydrogenated amorphous silicon by scanning ultrafast electron microscopy (SUEM).
Abstract: Charge carrier dynamics in amorphous semiconductors has been a topic of intense research that has been propelled by modern applications in thin-film solar cells, transistors and optical sensors. Charge transport in these materials differs fundamentally from that in crystalline semiconductors owing to the lack of long-range order and high defect density. Despite the existence of well-established experimental techniques such as photoconductivity time-of-flight and ultrafast optical measurements, many aspects of the dynamics of photo-excited charge carriers in amorphous semiconductors remain poorly understood. Here, we demonstrate direct imaging of carrier dynamics in space and time after photo-excitation in hydrogenated amorphous silicon (a-Si:H) by scanning ultrafast electron microscopy (SUEM). We observe an unexpected regime of fast diffusion immediately after photoexcitation, together with spontaneous electron–hole separation and charge trapping induced by the atomic disorder. Our findings demonstrate the rich dynamics of hot carrier transport in amorphous semiconductors that can be revealed by direct imaging based on SUEM.

Journal ArticleDOI
TL;DR: In this article, the underlying mechanism by which long single-crystal silicon fibers, which are novel platforms for silicon photonics, can be achieved by this process using finite element modeling, is explored.
Abstract: Semiconductor core optical fibers with a silica cladding are of great interest in nonlinear photonics and optoelectronics applications. Laser crystallization has been recently demonstrated for crystallizing amorphous silicon fibers into crystalline form. Here we explore the underlying mechanism by which long single-crystal silicon fibers, which are novel platforms for silicon photonics, can be achieved by this process. Using finite element modeling, we construct a laser processing diagram that reveals a parameter space within which single crystals can be grown. Utilizing this diagram, we illustrate the creation of single-crystal silicon core fibers by laser crystallizing amorphous silicon deposited inside silica capillary fibers by high-pressure chemical vapor deposition. The single-crystal fibers, up to 5.1 mm long, have a very well-defined core/cladding interface and a chemically pure silicon core that leads to very low optical losses down to ∼0.47–1 dB/cm at the standard telecommunication wavelength (1...

Journal ArticleDOI
TL;DR: In this paper, the authors investigated the atomic-scale subsurface damage in single-crystal silicon carbide (SiC) induced by EDM using Raman spectroscopy and transmission electron microscopy (TEM).

Journal ArticleDOI
TL;DR: In this article, the porosity and thermal conductivity of individual electrolessly etched single-crystalline silicon nanowires were measured using a novel electron-beam heating technique. And they were found to exhibit extremely low diffusive thermal conductivities (as low as 0.33 W m^(−1) K^( −1) at 300 K for 43% porosity), even lower than amorphous silicon.
Abstract: Porous materials provide a large surface-to-volume ratio, thereby providing a knob to alter fundamental properties in unprecedented ways. In thermal transport, porous nanomaterials can reduce thermal conductivity by not only enhancing phonon scattering from the boundaries of the pores and therefore decreasing the phonon mean free path, but also by reducing the phonon group velocity. Herein, a structure–property relationship is established by measuring the porosity and thermal conductivity of individual electrolessly etched single-crystalline silicon nanowires using a novel electron-beam heating technique. Such porous silicon nanowires exhibit extremely low diffusive thermal conductivity (as low as 0.33 W m^(−1) K^(−1) at 300 K for 43% porosity), even lower than that of amorphous silicon. The origin of such ultralow thermal conductivity is understood as a reduction in the phonon group velocity, experimentally verified by measuring the Young's modulus, as well as the smallest structural size ever reported in crystalline silicon (<5 nm). Molecular dynamics simulations support the observation of a drastic reduction in thermal conductivity of silicon nanowires as a function of porosity. Such porous materials provide an intriguing platform to tune phonon transport, which can be useful in the design of functional materials toward electronics and nanoelectromechanical systems.

Journal ArticleDOI
TL;DR: In this article, a-Si:H transparent solar cells using ultrathin transparent multi-layered electrodes (TMEs) as rear-side transparent electrodes for building-integrated photovoltaic (BIPV) windows were designed to have high transparency and conductance.

Journal ArticleDOI
TL;DR: It is observed that devices with rougher oxide-electrode interfaces exhibit lower electroforming voltages and more reliable switching behaviour, and columnar microstructure in the oxide will be a key factor to consider for the optimization of future SiOx-based resistance random access memory.
Abstract: We studied intrinsic resistance switching behaviour in sputter-deposited amorphous silicon suboxide (a-SiO x ) films with varying degrees of roughness at the oxide-electrode interface. By combining electrical probing measurements, atomic force microscopy (AFM), and scanning transmission electron microscopy (STEM), we observe that devices with rougher oxide-electrode interfaces exhibit lower electroforming voltages and more reliable switching behaviour. We show that rougher interfaces are consistent with enhanced columnar microstructure in the oxide layer. Our results suggest that columnar microstructure in the oxide will be a key factor to consider for the optimization of future SiOx-based resistance random access memory.

Journal ArticleDOI
TL;DR: In this article, the impact of different smooth and textured back reflectors was explored and effectuated to study the optical phenomena with interface engineering strategies and characteristics of transparent contacts in thin-film solar cells.
Abstract: In thin-film solar cells, the photocurrent conversion productivity can be distinctly boosted-up utilizing a proper back reflector. Herein, the impact of different smooth and textured back reflectors was explored and effectuated to study the optical phenomena with interface engineering strategies and characteristics of transparent contacts. A unique type of wet-chemically textured glass-substrate 3D etching mask used in superstrate (p–i–n) amorphous silicon-based solar cell along with legitimated back reflector permits joining the standard light-trapping methodologies, which are utilized to upgrade the energy conversion efficiency (ECE). To investigate the optical and electrical properties of solar cell structure, the optical simulations in three-dimensional measurements (3D) were performed utilizing finite-difference time-domain (FDTD) technique. This design methodology allows to determine the power losses, quantum efficiencies, and short-circuit current densities of various layers in such solar cell. The short-circuit current densities for different reflectors were varied from 11.50 to 13.27 and 13.81 to 16.36 mA/cm2 for the smooth and pyramidal textured solar cells, individually. Contrasted with the comparable flat reference cell, the short-circuit current density of textured solar cell was increased by around 24%, and most extreme outer quantum efficiencies rose from 79 to 86.5%. The photon absorption was fundamentally improved in the spectral region from 600 to 800 nm with no decrease of photocurrent shorter than 600-nm wavelength. Therefore, these optimized designs will help to build the effective plans next-generation amorphous silicon-based solar cells.

Journal ArticleDOI
TL;DR: The atomic structure of amorphous silicon consistent with several reported experimental measurements has been obtained from annealing simulations using electron density functional theory calculations and a systematic removal of weakly bound atoms as discussed by the authors.
Abstract: Atomic structure of amorphous silicon consistent with several reported experimental measurements has been obtained from annealing simulations using electron density functional theory calculations and a systematic removal of weakly bound atoms The excess energy and density with respect to the crystal are well reproduced in addition to radial distribution function, angular distribution functions, and vibrational density of states No atom in the optimal configuration is locally in a crystalline environment as deduced by ring analysis and common neighbor analysis, but coordination defects are present at a level of 1%–2% The simulated samples provide structural models of this archetypal disordered covalent material without preconceived notion of the atomic ordering or fitting to experimental data

Journal ArticleDOI
TL;DR: In this article, the authors present a review on silicon-based nonlinear devices for all optical nonlinear processing of complex telecommunication signals and discuss some recent developments achieved by their research group, through extensive collaborations with academic partners across Europe, on optical signal processing using silicon-germanium and amorphous silicon based waveguides.
Abstract: In this paper, we present a review on silicon-based nonlinear devices for all optical nonlinear processing of complex telecommunication signals. We discuss some recent developments achieved by our research group, through extensive collaborations with academic partners across Europe, on optical signal processing using silicon-germanium and amorphous silicon based waveguides as well as novel materials such as silicon rich silicon nitride and tantalum pentoxide. We review the performance of four wave mixing wavelength conversion applied on complex signals such as Differential Phase Shift Keying (DPSK), Quadrature Phase Shift Keying (QPSK), 16-Quadrature Amplitude Modulation (QAM) and 64-QAM that dramatically enhance the telecom signal spectral efficiency, paving the way to next generation terabit all-optical networks.