J
Jong-Ho Lee
Researcher at Seoul National University
Publications - 1054
Citations - 14204
Jong-Ho Lee is an academic researcher from Seoul National University. The author has contributed to research in topics: Field-effect transistor & Threshold voltage. The author has an hindex of 45, co-authored 928 publications receiving 11335 citations. Previous affiliations of Jong-Ho Lee include Massachusetts Institute of Technology & Kyungpook National University.
Papers
More filters
Journal ArticleDOI
Hot carrier-induced degradation in bulk FinFETs
Sang-Yun Kim,Jong-Ho Lee +1 more
TL;DR: In this article, the hot-carrier effects in n-channel bulk FinFETs were investigated for the first time, and the hotcarrier degradation was checked by changing the fin body width, and increased with decreasing the width.
Journal ArticleDOI
Low frequency noise characteristics of resistor- and Si MOSFET-type gas sensors fabricated on the same Si wafer with In2O3 sensing layer
Wonjun Shin,Gyuweon Jung,Seongbin Hong,Yujeong Jeong,Jinwoo Park,Dongkyu Jang,Byung-Gook Park,Jong-Ho Lee +7 more
TL;DR: In this article, the low frequency noise (LFN) characteristics of the resistor-type and the Si metal oxide semiconductor Field Effect Transistor (FET)-type gas sensors fabricated on the same wafer were systemically examined.
Patent
Dermal substitute consisting of amnion and biodegradable polymer, the preparation method and the use thereof
Ki-Ho Kim,Eun-Kyung Yang,Sung-Po Kim,Kang-Il Ko,Jong-Won Lee,Hyun-Mi Chang,Jong-Ho Lee,Kihwan Han,Daegu Son +8 more
TL;DR: In this paper, a dermal substitute with amnion instead of silicone membrane has been proposed, which has several advantages, such as better biocompatibility, anti-inflammatory activity and promoting activity of wound healing and commercial utilization as basement membrane.
Patent
Method of fabricating metal silicate layer using atomic layer deposition technique
TL;DR: In this article, the authors provided methods of fabricating a metal silicate layer on a semiconductor substrate using an atomic layer deposition technique, where the metal oxide layer formation cycle includes the steps of supplying a metal source gas to a reactor containing the substrate, exhausting the metal source gases remaining in a reactor to clean the inside of the reactor, and then supplying an oxide gas into the reactor.
Journal ArticleDOI
Conduction and Low-Frequency Noise Analysis in $ \hbox{Al}/\alpha\hbox{-TiO}_{X}/\hbox{Al}$ Bipolar Switching Resistance Random Access Memory Devices
Jungkyu K. Lee,Hu Young Jeong,In-Tak Cho,Jeong Yong Lee,Sung-Yool Choi,Hyuck-In Kwon,Jong-Ho Lee +6 more
TL;DR: In this paper, the authors investigated the low-frequency noise properties of the bipolar switching resistance random access memories (RRAMs) for the first time with amorphous TiOx-based RRAM devices.