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Jong-Ho Lee

Researcher at Seoul National University

Publications -  1054
Citations -  14204

Jong-Ho Lee is an academic researcher from Seoul National University. The author has contributed to research in topics: Field-effect transistor & Threshold voltage. The author has an hindex of 45, co-authored 928 publications receiving 11335 citations. Previous affiliations of Jong-Ho Lee include Massachusetts Institute of Technology & Kyungpook National University.

Papers
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Journal ArticleDOI

Biomechanical Evaluation of Magnesium-Based Resorbable Metallic Screw System in a Bilateral Sagittal Split Ramus Osteotomy Model Using Three-Dimensional Finite Element Analysis

TL;DR: The Mg-based resorbable screw system is a promising alternative to the IN-based system and its biomechanical stability is compared with those of titanium (Ti)-based and polymer (IN)-based systems.
Proceedings ArticleDOI

Improvement of NBTI and electrical characteristics by ozone pre-treatment and PBTI issues in HfAlO(N) high-k gate dielectrics

TL;DR: In this article, the effect of ozone pre-treatment on bias temperature instability (BTI) and electrical properties of high-k gate dielectrics was investigated, and it was shown that O/sub 3/pre-treatment effectively suppresses the incorporation of impurities (such as nitrogen (N), hydrogen (H), and water related species), resulting in the improvement of NBTI characteristics.
Proceedings ArticleDOI

A study of ESD-induced latent damage in CMOS integrated circuits

TL;DR: In this paper, the latent damage for transistors at the package level has been performed with various kinds of ESD stress modes and the impact of latent damage on circuit performance degradation was also evaluated using a 64 Mb DRAM chip as a DUT.
Patent

Post thermal treatment methods of forming high dielectric layers over interfacial layers in integrated circuit devices

TL;DR: In this article, high dielectric layers formed from layers of hafnium oxide, zirconium oxide or aluminum oxide, yttrium oxide, and other metal oxides and silicates disposed on silicon substrates or ozone oxide layers over silicon substrate were treated by oxidation, annealing, or a combination of oxidation and anneal to form high dieelastic layers having superior mobility and interfacial characteristics.