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Samit K. Ray

Researcher at Indian Institute of Technology Kharagpur

Publications -  542
Citations -  9698

Samit K. Ray is an academic researcher from Indian Institute of Technology Kharagpur. The author has contributed to research in topics: Photoluminescence & Thin film. The author has an hindex of 44, co-authored 507 publications receiving 8085 citations. Previous affiliations of Samit K. Ray include University of Delaware & Indian Institute of Technology Kanpur.

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Journal ArticleDOI

Effect of annealing temperature on the structural and electrical properties of SrBi2Ta2O9 thin films for memory-based applications

TL;DR: In this paper, Ferroelectric SrBi 2 Ta 2 O 9 (SBT) thin films were grown on p-type Si substrates by radio frequency sputtering technique and the crystallinity of the films were studied using grazing incidence X-ray diffraction pattern.
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Morphology and growth of capped Ge/Si quantum dots

TL;DR: In this paper, the morphology, atomic structure, and chemical composition of small (4nm average height and 20nm average diameter), dense capped MBE-grown Ge/Si quantum dots are studied using an energy-differential extension of the direct X-ray phasing method, COBRA.
Journal ArticleDOI

High indium non-polar InGaN clusters with infrared sensitivity grown by PAMBE

TL;DR: In this article, the growth of self assembled non-polar high indium clusters of In0.55Ga0.45N over nonpolar (11-20) a-plane In 0.17Ga 0.83N epilayer grown on a plane (11 -20)GaN/(1-102) r-plane sapphire substrate using plasma assisted molecular beam epitaxy (PAMBE).
Book ChapterDOI

Humidity Sensing by Chemically Reduced Graphene Oxide

TL;DR: In this article, Indium Tin Oxide (ITO) coated glass was taken as the basic substrate for sensing layer deposition and sensitivity tests for relative humidity (RH) measurements were carried out at five different concentrations of humid air at room temperature.
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Effect of carbon on lattice strain and hole mobility in Si1-xGex alloys

TL;DR: Pseudomorphic Si-Si Raman mode vibrations on strain and composition of binary and ternary alloys have been explained with experimental and theoretically calculated results as mentioned in this paper, where the Hall hole mobility is found to increase with decreasing compressive strain or effective Ge content in the layer throughout the temperature range of 120-300 K.