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Journal ArticleDOI

SiC and GaN devices – wide bandgap is not all the same

Nando Kaminski, +1 more
- 01 May 2014 - 
- Vol. 8, Iss: 3, pp 227-236
TLDR
In this article, it is shown that material cost and quality will finally decide the commercial success of wide bandgap devices, whereas GaN on silicon would offer an unrivalled cost advantage.
Abstract
Silicon carbide (SiC)-diodes have been commercially available since 2001 and various SiC-switches have been launched recently. Parallelly, gallium nitride (GaN) is moving into power electronics and the first low-voltage devices are already on the market. Currently, it seems that GaN-transistors are ideal for high frequency ICs up to 1kV (maybe 2kV) and maximum a few 10A. SiC transistors are better suited for discrete devices or modules blocking 1kV and above and virtually no limit in the current but in that range they will face strong competition from the silicon insulated gate bipolar transistors (IGBTs). SiC and GaN Schottky-diodes would offer a similar performance, hence here it becomes apparent that material cost and quality will finally decide the commercial success of wide bandgap devices. Bulk GaN is still prohibitively expensive, whereas GaN on silicon would offer an unrivalled cost advantage. Devices made from the latter could be even cheaper than silicon devices. However, packaging is already a limiting factor for silicon devices even more so in exploiting the advantage of wide bandgap materials with respect to switching speed and high temperature operation. After all, reliability is a must for any device no matter which material it is made of.

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Citations
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Journal ArticleDOI

Power module electronics in HEV/EV applications: New trends in wide-bandgap semiconductor technologies and design aspects

TL;DR: This work focuses on an in-deep review of the state of the art concerning the power module, identifying the electrical requirements for the modules and the power conversion topologies that will best suit future drives.
Journal ArticleDOI

Next generation electric drives for HEV/EV propulsion systems: Technology, trends and challenges

TL;DR: In this paper, a comprehensive review of the current technologies, future trends and enabling technologies that will make possible next generation hybrid and full electric vehicle (HEV/EV) drive systems is presented.
Journal ArticleDOI

Multidimensional device architectures for efficient power electronics

TL;DR: A review of multidimensional device architectures for power electronics can be found in this article , where the performance limits, scaling and material figure of merits of the different architectures are discussed.
Journal ArticleDOI

Evidence of Time-Dependent Vertical Breakdown in GaN-on-Si HEMTs

TL;DR: In this paper, the authors investigated the time-dependent vertical breakdown of GaN-on-Si power transistors based on electrical characterization, dc stress tests and electroluminescence measurements.
References
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Proceedings ArticleDOI

High voltage thin layer devices (RESURF devices)

TL;DR: The RESURF (Reduced SURface Field) as discussed by the authors is a diode-based diode structure for high voltage devices with very thin epitaxial or implanted layers, where crucial changes in the electric field distribution occur at or at least near the surface.
Journal ArticleDOI

High Breakdown Voltage Achieved on AlGaN/GaN HEMTs With Integrated Slant Field Plates

TL;DR: In this article, a self-aligned "slant-field-plate" technology is presented as an improvement over the discrete multiple field plates for high breakdown voltage AlGaN/GaN HEMTs.
Journal ArticleDOI

Critical Voltage for Electrical Degradation of GaN High-Electron Mobility Transistors

TL;DR: In this article, a critical drain-to-gate voltage beyond which GaN high-electron mobility transistors start to degrade in electrical-stress experiments was found, which is consistent with a degradation mechanism based on crystallographic defect formation due to the inverse piezoelectric effect.
Journal ArticleDOI

Extremely Low On-Resistance and High Breakdown Voltage Observed in Vertical GaN Schottky Barrier Diodes with High-Mobility Drift Layers on Low-Dislocation-Density GaN Substrates

TL;DR: In this article, a high quality n-GaN drift-layer with an electron mobility of 930 cm2 V-1 s-1 was obtained by optimizing the growth conditions by reducing the intensity of yellow luminescence using conventional photoluminescence measurements.
Proceedings ArticleDOI

High performance SiC trench devices with ultra-low ron

TL;DR: In this article, the authors have developed SiC trench structure Schottky diodes and SiC double-trench MOSFETs to improve device performance by reducing the electric field through the introduction of the aforementioned trench structures.
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