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Institution

Applied Science Private University

EducationAmman, Jordan
About: Applied Science Private University is a education organization based out in Amman, Jordan. It is known for research contribution in the topics: Catalysis & Population. The organization has 4124 authors who have published 5299 publications receiving 116167 citations.


Papers
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Journal ArticleDOI
TL;DR: In general, the N. oleander and C. erectus species were found to have the highest absorption rate from the atmosphere and soil than other studied species, and are very suitable tools for managing air pollution in highly industrialized areas.

38 citations

Journal ArticleDOI
TL;DR: In this article, the above threshold ionization (ATI) spectra for argon in a strong, few-cycle 400 nm laser pulse with an ab initio solution of the time-dependent Schrodinger equation was calculated by using a model based on the strong field approximation.
Abstract: We have calculated above-threshold-ionization (ATI) spectra for argon in a strong, few-cycle 400 nm laser pulse with an ab initio solution of the time-dependent Schr\"odinger equation and by using a model based on the strong field approximation. We find additional peaks in the resulting ATI spectra which are not present for longer pulses. This substructure is due to the rapidly changing ponderomotive potential in the short laser pulse. It is sensitive to the pulse duration and the pulse envelope and is a general feature of ionization spectra originating from a short, intense laser pulse.

38 citations

Journal ArticleDOI
TL;DR: In this paper, the electrical characterization of Si-ion implanted AlN layers and the first demonstration of metal-semiconductor field effect transistors (MESFETs) with an ion-implanted AlN channel were reported.
Abstract: We report on the electrical characterization of Si-ion implanted AlN layers and the first demonstration of metal–semiconductor field-effect transistors (MESFETs) with an ion-implanted AlN channel. The ion-implanted AlN layers with Si dose of 5 × 1014 cm−2 exhibit n-type characteristics after thermal annealing at 1230 °C. The ion-implanted AlN MESFETs provide good drain current saturation and stable pinch-off operation even at 250 °C. The off-state breakdown voltage is 2370 V for drain-to-gate spacing of 25 µm. These results show the great potential of AlN-channel transistors for high-temperature and high-power applications.

38 citations

Journal ArticleDOI
TL;DR: In this article, the authors analyzed the critical transportation disruption factors of the supply chain of automotive parts manufacturing company and represented the interrelationships using the best-worst (BWM) and rough strength-relation (RSR) analysis methods.

38 citations

Journal ArticleDOI
TL;DR: In this article, porous silicon (PS) has been prepared by electrochemical etching technique and then ZnO thin film deposition on PS by spray pyrolysis method.
Abstract: In this paper porous silicon (PS) has been prepared by electrochemical etching technique and then ZnO thin film deposition on PS by spray pyrolysis method, the study of AFM show improve the structural stability of the PS substrate with crystalline growth of ZnO thin film. PL spectra explained a blue-shifting in PS layer come from oxidation the surface of PS after coating with ZnO film, Raman measurement show quantum confinement in PS layers with decreasing in variation mode of ZnO film, and the J-V characteristic show increasing in resistivity of Al/ZnO/PS/ c -Si/Al due to increasing in depletion layer junction compere with PS layer.

38 citations


Authors

Showing all 4150 results

NameH-indexPapersCitations
Hua Zhang1631503116769
Menachem Elimelech15754795285
Yu Huang136149289209
Dmitri Golberg129102461788
Andrea Carlo Marini123123672959
Dionysios D. Dionysiou11667548449
Liyuan Han11476665277
Shunichi Fukuzumi111125652764
John A. Stankovic10955951329
Judea Pearl10751283978
Feng Wang107113664644
O. C. Zienkiewicz10745571204
Jeffrey I. Zink9950942667
Kazuhiro Hono9887833534
Robert W. Boyd98116137321
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20239
202255
2021599
2020473
2019404
2018355