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Journal ArticleDOI

Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

TLDR
A novel semiconducting material is proposed—namely, a transparent amorphous oxide semiconductor from the In-Ga-Zn-O system (a-IGZO)—for the active channel in transparent thin-film transistors (TTFTs), which are fabricated on polyethylene terephthalate sheets and exhibit saturation mobilities and device characteristics are stable during repetitive bending of the TTFT sheet.
Abstract
Transparent electronic devices formed on flexible substrates are expected to meet emerging technological demands where silicon-based electronics cannot provide a solution. Examples of active flexible applications include paper displays and wearable computers1. So far, mainly flexible devices based on hydrogenated amorphous silicon (a-Si:H)2,3,4,5 and organic semiconductors2,6,7,8,9,10 have been investigated. However, the performance of these devices has been insufficient for use as transistors in practical computers and current-driven organic light-emitting diode displays. Fabricating high-performance devices is challenging, owing to a trade-off between processing temperature and device performance. Here, we propose to solve this problem by using a novel semiconducting material—namely, a transparent amorphous oxide semiconductor from the In-Ga-Zn-O system (a-IGZO)—for the active channel in transparent thin-film transistors (TTFTs). The a-IGZO is deposited on polyethylene terephthalate at room temperature and exhibits Hall effect mobilities exceeding 10 cm2 V-1 s-1, which is an order of magnitude larger than for hydrogenated amorphous silicon. TTFTs fabricated on polyethylene terephthalate sheets exhibit saturation mobilities of 6–9 cm2 V-1 s-1, and device characteristics are stable during repetitive bending of the TTFT sheet.

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Citations
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Patent

Pulse signal output circuit and shift register

TL;DR: In this article, the first to tenth transistors were used to provide a pulse signal output circuit capable of operating stably and a shift register including the PSE output circuit, and the first transistor was larger than the second transistor and the third transistor was smaller than the fourth transistor.
Journal ArticleDOI

Transparent conducting properties of SrSnO3 and ZnSnO3

TL;DR: In this paper, the optical properties of doped n-type SrSnO3 and ZnsnO3 in relation to potential application as transparent conductors are reported. But the performance of these conductors is limited by the orthorhombic distortion of the perovskite structure in the visible as the doping level is increased.
Journal ArticleDOI

Gate-Bias Stress Stability of P-Type SnO Thin-Film Transistors Fabricated by RF-Sputtering

TL;DR: In this article, the gate-bias stress stability of p-type tin monoxide (SnO) thin-film transistors was investigated, and it was shown that the dominant mechanism of the threshold voltage shift is the charge trapping at the interface between the active layer and the gate dielectric or near the interface.
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Semiconductor device, display device and electronic apparatus

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TL;DR: In this paper, an N channel transistor and a P channel transistor are used to apply a CMOS inverter to a pixel to control lighting/non-lighting of a pixel, in accordance with characteristic variations of a transistor forming the resistance load inverter.
References
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Journal ArticleDOI

Organic Thin Film Transistors for Large Area Electronics

TL;DR: In this article, the authors present new insight into conduction mechanisms and performance characteristics, as well as opportunities for modeling properties of organic thin-film transistors (OTFTs) and discuss progress in the growing field of n-type OTFTs.
Journal ArticleDOI

Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor

TL;DR: The fabrication of transparent field-effect transistors using a single-crystalline thin-film transparent oxide semiconductor, InGaO3(ZnO)5, as an electron channel and amorphous hafnium oxide as a gate insulator provides a step toward the realization of transparent electronics for next-generation optoelectronics.
Book

Fundamentals of Modern VLSI Devices

Yuan Taur, +1 more
TL;DR: In this article, the authors highlight the intricate interdependencies and subtle tradeoffs between various practically important device parameters, and also provide an in-depth discussion of device scaling and scaling limits of CMOS and bipolar devices.
Journal ArticleDOI

P-type electrical conduction in transparent thin films of CuAlO2

TL;DR: In this paper, the authors describe a strategy for identifying oxide materials that should combine p-type conductivity with good optical transparency, and illustrate the potential of this approach by reporting the properties of thin films of CuAlO2, a transparent oxide having room-temperature p- type conductivity up to 1'S'cm−1.
Journal ArticleDOI

Carrier transport in transparent oxide semiconductor with intrinsic structural randomness probed using single-crystalline InGaO3(ZnO)5 films

TL;DR: In this article, the authors investigated carrier transport in a crystalline oxide semiconductor InGaO3(ZnO)5 using single-crystalline thin films and showed that when carrier concentration is less than 2×1018cm−3, logarithm of electrical conductivity decreases in proportion to T−1∕4 and room-temperature Hall mobility was as low as ∼1cm2(Vs)−1.
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