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Journal ArticleDOI

When group-III nitrides go infrared: New properties and perspectives

Junqiao Wu
- 01 Jul 2009 - 
- Vol. 106, Iss: 1, pp 011101
TLDR
In this paper, the bandgap of InN was revised from 1.9 eV to a much narrower value of 0.64 eV, which is the smallest bandgap known to date.
Abstract
Wide-band-gap GaN and Ga-rich InGaN alloys, with energy gaps covering the blue and near-ultraviolet parts of the electromagnetic spectrum, are one group of the dominant materials for solid state lighting and lasing technologies and consequently, have been studied very well. Much less effort has been devoted to InN and In-rich InGaN alloys. A major breakthrough in 2002, stemming from much improved quality of InN films grown using molecular beam epitaxy, resulted in the bandgap of InN being revised from 1.9 eV to a much narrower value of 0.64 eV. This finding triggered a worldwide research thrust into the area of narrow-band-gap group-III nitrides. The low value of the InN bandgap provides a basis for a consistent description of the electronic structure of InGaN and InAlN alloys with all compositions. It extends the fundamental bandgap of the group III-nitride alloy system over a wider spectral region, ranging from the near infrared at ∼1.9 μm (0.64 eV for InN) to the ultraviolet at ∼0.36 μm (3.4 eV for GaN...

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Citations
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Journal ArticleDOI

Effect of temperature and V/III ratio on the initial growth of indium nitride using plasma-assisted metal-organic chemical vapor deposition

TL;DR: In this article, the growth of Indium nitride (InN) was studied in the nucleation stage by metal-organic chemical vapor deposition technique using atomic nitrogen from an RF microwave plasma source.
Dissertation

Étude et caractérisations par cathodoluminescence de couches minces d'InGaN pour le photovoltaïque

TL;DR: In this paper, a technique de croissance originale consistant a inserer periodiquement de fine couches de GaN dans la couche epaisse d'InGaN was proposed.
Journal ArticleDOI

Schottky barrier parameters and structural properties of rapidly annealed Zr Schottky electrode on p-type GaN

TL;DR: In this article, the Schottky barrier junction parameters and structural properties of Zr/p-GaN-Schottky diode are explored at various annealing temperatures.
Journal ArticleDOI

Red light emitting diodes based on the type-II InGaN-ZnSnN2/GaN quantum wells

TL;DR: In this article, the Schrodinger and Poisson equations were used to compute the overlap of electron-hole wave functions in the type-II InGaN-ZnSnN2/GaN QW diodes for red emission.
Journal ArticleDOI

Leak path passivation by in situ Al-N for InGaN solar cells operating at wavelengths up to 570 nm

TL;DR: In this article, a leak path passivation (LPP) technology for InGaN solar cells with photo-response up to 570nm was developed by inserting in situ monolayers of Al-N into active layers.
References
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Journal ArticleDOI

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Journal ArticleDOI

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Journal ArticleDOI

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Journal ArticleDOI

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