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Journal ArticleDOI

When group-III nitrides go infrared: New properties and perspectives

Junqiao Wu
- 01 Jul 2009 - 
- Vol. 106, Iss: 1, pp 011101
TLDR
In this paper, the bandgap of InN was revised from 1.9 eV to a much narrower value of 0.64 eV, which is the smallest bandgap known to date.
Abstract
Wide-band-gap GaN and Ga-rich InGaN alloys, with energy gaps covering the blue and near-ultraviolet parts of the electromagnetic spectrum, are one group of the dominant materials for solid state lighting and lasing technologies and consequently, have been studied very well. Much less effort has been devoted to InN and In-rich InGaN alloys. A major breakthrough in 2002, stemming from much improved quality of InN films grown using molecular beam epitaxy, resulted in the bandgap of InN being revised from 1.9 eV to a much narrower value of 0.64 eV. This finding triggered a worldwide research thrust into the area of narrow-band-gap group-III nitrides. The low value of the InN bandgap provides a basis for a consistent description of the electronic structure of InGaN and InAlN alloys with all compositions. It extends the fundamental bandgap of the group III-nitride alloy system over a wider spectral region, ranging from the near infrared at ∼1.9 μm (0.64 eV for InN) to the ultraviolet at ∼0.36 μm (3.4 eV for GaN...

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Citations
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Journal ArticleDOI

Near-infrared phosphorescence: materials and applications

TL;DR: This review describes the overall progress made in the past ten years on NIR phosphorescent transition-metal complexes including Cu(I), Cu(II), Cr(III), Re(I, Re-I), Re-III, Ru(II) and Au(I) complexes, with a primary focus on material design complemented with a selection of optical, electronic, sensory, and biologic applications.
Journal ArticleDOI

Visible light-driven efficient overall water splitting using p -type metal-nitride nanowire arrays

TL;DR: It is shown that efficient and stable stoichiometric dissociation of water into hydrogen and oxygen can be achieved under visible light by eradicating the potential barrier on nonpolar surfaces of indium gallium nitride nanowires through controlled p-type dopant incorporation.

Valence band splittings and band offsets of AlN, GaN and InN.

Su-Huai Wei, +1 more
TL;DR: In this article, first principles electronic structure calculations on wurtzite AlN, GaN, and InN reveal crystal field splitting parameters ΔCF of −217, 42, and 41 meV, respectively.
Journal ArticleDOI

Conductivity in transparent oxide semiconductors

TL;DR: Understanding this interplay, as well as the microscopic contenders for providing the conductivity of these materials, will prove essential to the future design and control of TCO semiconductors, and their implementation into novel multifunctional devices.
Journal ArticleDOI

InGaN Solar Cells: Present State of the Art and Important Challenges

TL;DR: A review on the present state of the art of In-based solar cells is presented and the most important challenges toward the high-efficiency N materials are discussed in the context of the recent results.
References
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Journal ArticleDOI

Evidence of electron accumulation at nonpolar surfaces of InN nanocolumns

TL;DR: In this article, high-quality InN nanocolumns grown by molecular beam epitaxy on n-type Si(111) have been electrically characterized by atomic force microscopy.
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Shallow donor state of hydrogen in indium nitride

TL;DR: In this paper, the behavior of positive muons, which mimic protons when implanted into semiconductors, has been investigated and it has been shown that the muons capture electrons below 60 K, forming paramagnetic centers with a binding energy of about 12 meV.
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Nonparabolic coupled Poisson-Schrodinger solutions for quantized electron accumulation layers : Band bending, charge profile, and subbands at InN surfaces

TL;DR: In this paper, the one-electron potential, carrier concentration profile, quantized subband state energies, and parallel dispersion relations are calculated for an accumulation layer at a semiconductor surface by solving Poisson's equation within a modified Thomas-Fermi approximation and numerically solving the Schrodinger equation for the resulting potential well.
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X-ray photoemission spectroscopic investigation of surface treatments, metal deposition, and electron accumulation on InN

TL;DR: In this article, the effects of surface chemical treatments and metal deposition on the InN surface were studied via synchrotron-based photoemission spectroscopy, showing that the surface Fermi level lies at or above the conduction band maximum when a value of InN band gap of 0.7-0.9 eV is assumed.
Journal ArticleDOI

The effects of oxygen contamination on the properties of reactively sputtered indium nitride films

TL;DR: In this article, it was shown that the oxygen forms an amorphous indium oxynitride that exists in an InN polycrystalline matrix, and that this amorphus decreases the electron mobility of the films.
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