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Journal ArticleDOI

When group-III nitrides go infrared: New properties and perspectives

Junqiao Wu
- 01 Jul 2009 - 
- Vol. 106, Iss: 1, pp 011101
TLDR
In this paper, the bandgap of InN was revised from 1.9 eV to a much narrower value of 0.64 eV, which is the smallest bandgap known to date.
Abstract
Wide-band-gap GaN and Ga-rich InGaN alloys, with energy gaps covering the blue and near-ultraviolet parts of the electromagnetic spectrum, are one group of the dominant materials for solid state lighting and lasing technologies and consequently, have been studied very well. Much less effort has been devoted to InN and In-rich InGaN alloys. A major breakthrough in 2002, stemming from much improved quality of InN films grown using molecular beam epitaxy, resulted in the bandgap of InN being revised from 1.9 eV to a much narrower value of 0.64 eV. This finding triggered a worldwide research thrust into the area of narrow-band-gap group-III nitrides. The low value of the InN bandgap provides a basis for a consistent description of the electronic structure of InGaN and InAlN alloys with all compositions. It extends the fundamental bandgap of the group III-nitride alloy system over a wider spectral region, ranging from the near infrared at ∼1.9 μm (0.64 eV for InN) to the ultraviolet at ∼0.36 μm (3.4 eV for GaN...

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Citations
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Journal ArticleDOI

Near-infrared phosphorescence: materials and applications

TL;DR: This review describes the overall progress made in the past ten years on NIR phosphorescent transition-metal complexes including Cu(I), Cu(II), Cr(III), Re(I, Re-I), Re-III, Ru(II) and Au(I) complexes, with a primary focus on material design complemented with a selection of optical, electronic, sensory, and biologic applications.
Journal ArticleDOI

Visible light-driven efficient overall water splitting using p -type metal-nitride nanowire arrays

TL;DR: It is shown that efficient and stable stoichiometric dissociation of water into hydrogen and oxygen can be achieved under visible light by eradicating the potential barrier on nonpolar surfaces of indium gallium nitride nanowires through controlled p-type dopant incorporation.

Valence band splittings and band offsets of AlN, GaN and InN.

Su-Huai Wei, +1 more
TL;DR: In this article, first principles electronic structure calculations on wurtzite AlN, GaN, and InN reveal crystal field splitting parameters ΔCF of −217, 42, and 41 meV, respectively.
Journal ArticleDOI

Conductivity in transparent oxide semiconductors

TL;DR: Understanding this interplay, as well as the microscopic contenders for providing the conductivity of these materials, will prove essential to the future design and control of TCO semiconductors, and their implementation into novel multifunctional devices.
Journal ArticleDOI

InGaN Solar Cells: Present State of the Art and Important Challenges

TL;DR: A review on the present state of the art of In-based solar cells is presented and the most important challenges toward the high-efficiency N materials are discussed in the context of the recent results.
References
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Journal ArticleDOI

Conduction band offset at the InN∕GaN heterojunction

TL;DR: In this article, the conduction-band offset between GaN and InN is experimentally determined by combining electrical transport, capacitance-voltage, and photocurrent spectroscopy measurement results.
Journal ArticleDOI

Anion detection using ultrathin InN ion selective field effect transistors

TL;DR: In this article, an ion selective field effect transistors (ISFETs) have been demonstrated to perform ion sensing in aqueous solutions with a sensitivity of 5μA/decade and a response time smaller than 10s.
Journal ArticleDOI

Infrared lasing in InN nanobelts

TL;DR: In this paper, the infrared lasing action was observed at 20K in the InN nanobelts grown on an amorphous silicon nitride coated silicon substrate by continuous wave laser pumping.
Journal ArticleDOI

Characterisation of Multiple Carrier Transport in Indium Nitride Grown by Molecular Beam Epitaxy

TL;DR: In this article, the transport properties of two distinct electron species in indium nitride grown by molecular beam epitaxy (MBE) have been measured, attributed to the bulk electrons and a surface accumulation layer.
Journal ArticleDOI

Pressure dependence of the optical-absorption edge of AlN and graphite-type BN

TL;DR: In this paper, the effect of pressure on the band gap of graphite-type BN and AlN was studied up to 2.7 GPa at room temperature by measuring the optical absorption edge of single crystals of each substance.
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