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Journal ArticleDOI

High breakdown voltage AlGaN-GaN power-HEMT design and high current density switching behavior

TLDR
AlGaN-GaN power high-electron mobility transistors (HEMTs) with 600-V breakdown voltage are fabricated and demonstrated as switching power devices for motor drive and power supply applications.
Abstract
AlGaN-GaN power high-electron mobility transistors (HEMTs) with 600-V breakdown voltage are fabricated and demonstrated as switching power devices for motor drive and power supply applications. The fabricated power HEMT realized the high breakdown voltage by optimized field plate technique and the low on-state resistance of 3.3 m/spl Omega/cm/sup 2/, which is 20 times lower than that or silicon MOSFETs, thanks to the high critical field of GaN material and the high mobility in 2DEG channel. The fabricated devices also demonstrated the high current density switching of 850 A/cm/sup 2/ turn-off. These results show that AlGaN-GaN power-HEMTs are one of the most promising candidates for future switching power device for power electronics applications.

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Citations
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Journal ArticleDOI

Effect of substrate misorientation on the concentration of impurities and surface morphology of an epitaxial GaN layer on N-polar GaN substrate by MOVPE

TL;DR: In this article, the effect of misorientation on the residual impurity and surface morphology of N-polar GaN grown by metalorganic vapor phase epitaxy was examined, and it was shown that m-direction steps are stable for GaN growth.
Patent

Semiconductor device with high electron mobility transistor

TL;DR: In this article, the authors describe a semiconductor device consisting of a HEMT and a diode, which includes an anode electrically connected to the gate electrode and a cathode connecting to the drain electrode.

Dilute-Anion III-Nitride Semiconductor Materials and Nanostructures

TL;DR: Theoretical modeling of Auger process in III-Nitride Semiconductor 1.1.1 as mentioned in this paper, 3.2.3, 2.3.4, 3.4.
Proceedings ArticleDOI

A discussion on the DC and switching performance of a gallium nitride CAVET for 1.2kV application

TL;DR: In this article, a GaN CAVET has been simulated and analyzed using a device/circuit hybrid simulator implemented in Silvaco ATLAS, which was achieved by integrating the 2D drift-diffusion simulator with the SPICE based circuit simulator.
Journal ArticleDOI

A monolithically integrated micro-LED display based on GaN-on-silicon substrate

TL;DR: In this paper, an active matrix (AM) display was realized by interconnecting nitride-based LEDs as display pixels with Si thin-film transistors (TFTs) as driving circuitries.
References
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Journal ArticleDOI

Trends in power semiconductor devices

TL;DR: In this paper, the authors review recent trends in power semiconductor device technology that are leading to improvements in power losses for power electronic systems and predict that silicon carbide based switches will begin to displace these silicon devices.
Journal ArticleDOI

Wide bandgap compound semiconductors for superior high-voltage unipolar power devices

TL;DR: In this article, a critical evaluation of the performance capabilities of various wide bandgap semiconductors for high power and high frequency unipolar electronic devices is presented, and seven different figures of merit have been analyzed.
Proceedings ArticleDOI

A new generation of high voltage MOSFETs breaks the limit line of silicon

TL;DR: In this article, the authors proposed a new device concept for high voltage power devices based on charge compensation in the drift region of the transistor, which achieved a shrink factor of 5 versus the actual state of the art in power MOSFETs.
Journal ArticleDOI

10-W/mm AlGaN-GaN HFET with a field modulating plate

TL;DR: In this paper, a 1mm-wide field modulating plate (FP) was used to achieve a power density of 10.3 W with a linear gain of 18.0 dB and a power added efficiency of 47.3% at 2 GHz.
Journal ArticleDOI

High breakdown GaN HEMT with overlapping gate structure

TL;DR: In this paper, a GaN high electron mobility transistors (HEMTs) were fabricated using an overlapping-gate technique in which the drain-side edge of the metal gate overlaps on a high breakdown and high dielectric constant dielectrics.
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