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Journal ArticleDOI

High breakdown voltage AlGaN-GaN power-HEMT design and high current density switching behavior

TLDR
AlGaN-GaN power high-electron mobility transistors (HEMTs) with 600-V breakdown voltage are fabricated and demonstrated as switching power devices for motor drive and power supply applications.
Abstract
AlGaN-GaN power high-electron mobility transistors (HEMTs) with 600-V breakdown voltage are fabricated and demonstrated as switching power devices for motor drive and power supply applications. The fabricated power HEMT realized the high breakdown voltage by optimized field plate technique and the low on-state resistance of 3.3 m/spl Omega/cm/sup 2/, which is 20 times lower than that or silicon MOSFETs, thanks to the high critical field of GaN material and the high mobility in 2DEG channel. The fabricated devices also demonstrated the high current density switching of 850 A/cm/sup 2/ turn-off. These results show that AlGaN-GaN power-HEMTs are one of the most promising candidates for future switching power device for power electronics applications.

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Citations
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Journal ArticleDOI

A New Post Annealing Method for AlGaN/GaN Heterostructure Field-Effect Transistors Employing XeCl Excimer Laser Pulses

TL;DR: In this paper, a post annealing method employing excimer laser pulses is proposed to improve the transfer characteristics and the breakdown voltage of the unpassivated AlGaN/GaN heterostructure field effect transistor (HFET) and the passivated one.
Journal ArticleDOI

An Improved P-Type Doped Barrier Surface AlGaN/GaN High Electron Mobility Transistor with High Power-Added Efficiency

TL;DR: An improved P-type doped barrier surface AlGaN/GaN high electron mobility transistor with high power-added efficiency (PDBS-HEMT) is proposed in this paper.

Suppression of Kink in the Output Characteristics of AlInN/GaN High Electron Mobility Transistors by Post-Gate Metallization Annealing

TL;DR: In this paper , the effect of post-gate metallization annealing on the performance of GaN-based High Electron Mobility Transistors (HEMTs) was compared.
Journal ArticleDOI

Design and Simulation of Normally Off High‐Electron‐Mobility Light‐Emitting Transistor

TL;DR: In this article , a built-in normally off GaN-based high-electronmobility light-emitting transistor is designed and simulated using 2D computer aided design software (Silvaco's TCAD).
Journal ArticleDOI

Fabrication and characteristics of flexible normally-off AlGaN/GaN HEMTs

TL;DR: In this paper, a high electron mobility transistor (HEMT) silicon substrate was removed using mechanical grinding and deep silicon etching technology and successfully transferred to a PET substrate to achieve the flexible normally off HEMT.
References
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Journal ArticleDOI

Trends in power semiconductor devices

TL;DR: In this paper, the authors review recent trends in power semiconductor device technology that are leading to improvements in power losses for power electronic systems and predict that silicon carbide based switches will begin to displace these silicon devices.
Journal ArticleDOI

Wide bandgap compound semiconductors for superior high-voltage unipolar power devices

TL;DR: In this article, a critical evaluation of the performance capabilities of various wide bandgap semiconductors for high power and high frequency unipolar electronic devices is presented, and seven different figures of merit have been analyzed.
Proceedings ArticleDOI

A new generation of high voltage MOSFETs breaks the limit line of silicon

TL;DR: In this article, the authors proposed a new device concept for high voltage power devices based on charge compensation in the drift region of the transistor, which achieved a shrink factor of 5 versus the actual state of the art in power MOSFETs.
Journal ArticleDOI

10-W/mm AlGaN-GaN HFET with a field modulating plate

TL;DR: In this paper, a 1mm-wide field modulating plate (FP) was used to achieve a power density of 10.3 W with a linear gain of 18.0 dB and a power added efficiency of 47.3% at 2 GHz.
Journal ArticleDOI

High breakdown GaN HEMT with overlapping gate structure

TL;DR: In this paper, a GaN high electron mobility transistors (HEMTs) were fabricated using an overlapping-gate technique in which the drain-side edge of the metal gate overlaps on a high breakdown and high dielectric constant dielectrics.
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