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Journal ArticleDOI

High breakdown voltage AlGaN-GaN power-HEMT design and high current density switching behavior

TLDR
AlGaN-GaN power high-electron mobility transistors (HEMTs) with 600-V breakdown voltage are fabricated and demonstrated as switching power devices for motor drive and power supply applications.
Abstract
AlGaN-GaN power high-electron mobility transistors (HEMTs) with 600-V breakdown voltage are fabricated and demonstrated as switching power devices for motor drive and power supply applications. The fabricated power HEMT realized the high breakdown voltage by optimized field plate technique and the low on-state resistance of 3.3 m/spl Omega/cm/sup 2/, which is 20 times lower than that or silicon MOSFETs, thanks to the high critical field of GaN material and the high mobility in 2DEG channel. The fabricated devices also demonstrated the high current density switching of 850 A/cm/sup 2/ turn-off. These results show that AlGaN-GaN power-HEMTs are one of the most promising candidates for future switching power device for power electronics applications.

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Citations
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Journal ArticleDOI

YN nanostructure formation on the GaN(0 0 0 1) surface: First principles studies

TL;DR: In this article, the authors investigated the Y adsorption and YN thin film formation on the GaN(0, 0,0,1)-2,×-2 surfaces using first principles total energy calculations within the density functional theory.
Proceedings ArticleDOI

Growth of GaN single crystals by a Ca- and Ba-added Na flux method

TL;DR: In this article, the effects of additives (Ca, Ba) on the growth habit and impurity concentration in the GaN single crystals were investigated, showing that the growth habits could be changed from pyramidal shape to the prism shape.
Journal ArticleDOI

Comparative performance evaluation of lateral and vertical GaN high-voltage power field-effect transistors

TL;DR: In this paper, specific on-state resistance (R on,sp) and switching performance of various GaN power field-effect transistors (FETs) with 600 and 1200 V ratings were evaluated using analytical calculation and numerical simulation.
Journal ArticleDOI

Evaluation of titanium disilicide/copper Schottky gate for AlGaN/GaN high electron mobility transistors

TL;DR: In this paper, a gate leakage current of 5.15 × 10−7 mA mm−1 was found for a TiSi2/Cu gate device with a gate length of 5 μm and width of 200 μm.
Proceedings ArticleDOI

On the impact of buffer and GaN-channel thickness on current dispersion for GaN-on-Si RF/mmWave devices

TL;DR: In this paper, an improved and more robust current transient spectroscopy technique is used to extract the time constant spectra and the activation energies of various buffer defects in GaN-on-Si devices.
References
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Journal ArticleDOI

Trends in power semiconductor devices

TL;DR: In this paper, the authors review recent trends in power semiconductor device technology that are leading to improvements in power losses for power electronic systems and predict that silicon carbide based switches will begin to displace these silicon devices.
Journal ArticleDOI

Wide bandgap compound semiconductors for superior high-voltage unipolar power devices

TL;DR: In this article, a critical evaluation of the performance capabilities of various wide bandgap semiconductors for high power and high frequency unipolar electronic devices is presented, and seven different figures of merit have been analyzed.
Proceedings ArticleDOI

A new generation of high voltage MOSFETs breaks the limit line of silicon

TL;DR: In this article, the authors proposed a new device concept for high voltage power devices based on charge compensation in the drift region of the transistor, which achieved a shrink factor of 5 versus the actual state of the art in power MOSFETs.
Journal ArticleDOI

10-W/mm AlGaN-GaN HFET with a field modulating plate

TL;DR: In this paper, a 1mm-wide field modulating plate (FP) was used to achieve a power density of 10.3 W with a linear gain of 18.0 dB and a power added efficiency of 47.3% at 2 GHz.
Journal ArticleDOI

High breakdown GaN HEMT with overlapping gate structure

TL;DR: In this paper, a GaN high electron mobility transistors (HEMTs) were fabricated using an overlapping-gate technique in which the drain-side edge of the metal gate overlaps on a high breakdown and high dielectric constant dielectrics.
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