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Journal ArticleDOI

Analysis of enhanced light emission from highly strained germanium microbridges

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TLDR
In this paper, high-strained germanium on silicon samples with up to 3.1% uniaxial strain is fabricated and then investigated by Raman spectroscopy.
Abstract
Highly strained germanium on silicon samples with up to 3.1% uniaxial strain are fabricated and then investigated by Raman spectroscopy. During optical pumping, changes in both the emission wavelength and output power are observed, indicating that bandgap modification and optical gain are occurring.

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Citations
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Journal ArticleDOI

Enhanced room-temperature electroluminescence from a germanium waveguide on a silicon-on-insulator diode with a silicon nitride stressor.

TL;DR: In this article, a SiNx stressor was applied to a silicon-on-insulator (SOI) diode to a Ge waveguide for direct-band-gap electroluminescence.
Journal ArticleDOI

Optically pumped low-threshold microdisk lasers on a GeSn-on-insulator substrate with reduced defect density

TL;DR: In this article , the effect of defects on the lasing threshold of low-threshold GeSn infrared laser has been investigated, and a method of obtaining high-quality GeSn-on-insulator layers using low-temperature direct bonding and chemical-mechanical polishing is presented.
Patent

Method for producing a semiconductor structure comprising a stressed portion

TL;DR: In this article, a method for making a semiconductor structure comprising a constraint portion (40) and integral with a support layer (30) by molecular bonding, comprising the steps of a cavity is carried out (21) located in a structured part (11) so as to force a central portion ( 40) of the side portions (50) and a contacting and molecular bonding of the structured part with a supporting layer, the method being characterized by effecting a consolidation annealing.
Proceedings ArticleDOI

GeSn for nanoelectronic and optical applications

TL;DR: In this paper, the growth and material properties of GeSn alloys and their application possibilities in photonic and nanoelectronic devices are discussed, and the list of group IV semiconductors is being extended beyond Ge to the semimetal Sn.
References
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Journal ArticleDOI

Silicon optical modulators

TL;DR: The techniques that have, and will, be used to implement silicon optical modulators, as well as the outlook for these devices, and the candidate solutions of the future are discussed.
Journal ArticleDOI

High-performance Ge-on-Si photodetectors

TL;DR: In this article, the authors summarized the major developments in Ge-on-Si photodetectors, including epitaxial growth and strain engineering, free-space and waveguide-integrated devices, as well as recent progress in Geon-On-Si avalanche photodets.
Journal ArticleDOI

Electrically pumped hybrid AlGaInAs-silicon evanescent laser

TL;DR: An electrically pumped AlGaInAs-silicon evanescent laser architecture where the laser cavity is defined solely by the silicon waveguide and needs no critical alignment to the III-V active material during fabrication via wafer bonding is reported.
Journal ArticleDOI

Nonlinear silicon photonics

TL;DR: In this article, a review of nonlinear effects in silicon and highlights the important applications and technological solutions in nonlinear silicon photonics is presented. But the authors do not discuss the nonlinearities in silicon.
Journal ArticleDOI

Strained Si, SiGe, and Ge channels for high-mobility metal-oxide-semiconductor field-effect transistors

TL;DR: A review of the history and current progress in highmobility strained Si, SiGe, and Ge channel metal-oxide-semiconductor field effect transistors (MOSFETs) can be found in this article.
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