O
Oliver Ambacher
Researcher at Fraunhofer Society
Publications - 862
Citations - 29006
Oliver Ambacher is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Amplifier & Monolithic microwave integrated circuit. The author has an hindex of 64, co-authored 848 publications receiving 26256 citations. Previous affiliations of Oliver Ambacher include Osram & Siemens.
Papers
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Proceedings ArticleDOI
Investigation of GaN-on-Si and GaN-on-SOI Substrate Capacitances for Discrete and Monolithic Half-Bridges
TL;DR: In this article, the effect of the substrate capacitances and termination on the effective C ISS, C OSS, C RSS device capacitance and switch-node capacitance C SW, switching energy E SW and gate-charge Q G in half-bridges is analyzed.
Proceedings Article
Determination of suitable mHEMT transistor dimensioning for power amplification at 210 GHz by comprehensive measurements
Sebastian Diebold,Ingmar Kallfass,Hermann Massler,Arnulf Leuther,Axel Tessmann,P. Pahl,S. Koch,Michael Siegel,Oliver Ambacher +8 more
TL;DR: In this article, the properties of various mHEMT technologies and their advantages for millimeter-wave (mmW) power amplification are presented and an experimental determination of the most suitable transistor technology (i.e. gate-length, number of fingers, gatewidth and bias) for obtaining maximum gain, maximum output power and maximum power added efficiency at a given frequency of 210 GHz is determined.
Journal ArticleDOI
Optical study of gallium and nitrogen polarity layers of GaN grown on sapphire
Ana Cros,N.V. Joshi,T. Smith,Andrés Cantarero,G. Martı́nez-Criado,Oliver Ambacher,Martin Stutzmann +6 more
TL;DR: In this article, a confocal Raman spectroscopic study was carried out on either side of an intentionally grown GaN inversion domain boundary between a pair of strips with opposite (Ga- or N-) polarity.
Journal ArticleDOI
Ultra‐thin InGaN photodetectors for standing wave interferometry
TL;DR: In this article, the structural and optoelectronical characterisation of ultra-thin In-rich InxGa1-xN (0.56 < x < 1) metal-semiconductor-metal photodetectors designed for standing wave intensity profile measurements at the wavelength of He-Ne laser was reported.
Journal ArticleDOI
Changes of electronic properties of AlGaN/GaN HEMTs by surface treatment
Wilfried Pletschen,St. Linkohr,Lutz Kirste,Volker Cimalla,Stefan Müller,Marcel Himmerlich,Stefan Krischok,Oliver Ambacher +7 more
TL;DR: In this article, the impact of device processing and plasma treatments at different plasma conditions on the electronic transport properties of GaN/AlGaN/GaN heterostructures was investigated as well as annealing in nitrogen atmosphere at 425°C.