O
Oliver Ambacher
Researcher at Fraunhofer Society
Publications - 862
Citations - 29006
Oliver Ambacher is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Amplifier & Monolithic microwave integrated circuit. The author has an hindex of 64, co-authored 848 publications receiving 26256 citations. Previous affiliations of Oliver Ambacher include Osram & Siemens.
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Proceedings ArticleDOI
Electrical and optical properties of In 2 O 3 nanoparticles prepared by MOCVD
TL;DR: In this article, high sensitive ozone sensors working at room temperature were demonstrated based on In2O3 nanoparticles, which were deposited by metal organic chemical vapor deposition (MOCVD).
Proceedings ArticleDOI
AlGaN/GaN power amplifiers for ISM frequency applications
TL;DR: In this paper, an AlGaN/GaN Heterostructure Field Effect Transistors (HFETs) based high power amplifier was derived from a transistor with a total gate periphery of 120 mm that exhibits a breakdown voltage of 600 V. The transistor shows excellent DC characteristics up to 53 A in pulsed mode.
Journal ArticleDOI
The influence of the Al-content on the optical gain in AlGaN heterostructures
TL;DR: In this paper, the optical gain properties of AlGaN epilayers with aluminum contents varied between 0 and 0.23 in terms of photoluminescence and gain at various excitation densities up to 5MW/cm 2 using nanosecond excimerlaser pulses.
Proceedings ArticleDOI
AlGaN/GaN High Electron-mobility Varactors on Silicon Substrate
TL;DR: In this paper, an AlGaN/GaN high electron-mobility varactor grown on a high resistivity silicon substrate has been presented and compared to a GaN on silicon carbide technology.
Journal ArticleDOI
AlGaN/GaN Based Heterostructures for MEMS and NEMS Applications
Volker Cimalla,C.-C. Röhlig,Vadim Lebedev,Oliver Ambacher,Katja Tonisch,F. Niebelschütz,K. Brueckner,Matthias Hein +7 more
TL;DR: In this article, a two-dimensional electron gas confined in AlGaN/GaN heterostructures was used as an integrated back electrode for the fabrication of full-nitride MEMS.