scispace - formally typeset
Journal ArticleDOI

Solid solubilities of impurity elements in germanium and silicon

F. A. Trumbore
- 01 Jan 1960 - 
- Vol. 39, Iss: 1, pp 205-233
Reads0
Chats0
TLDR
In this paper, the available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves.
Abstract
The available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves. New solubility data are presented for the lead-germanium, zinc-germanium, indium-germanium, antimony-silicon, gallium-silicon and aluminum-silicon systems. The correlation of the solid solubilities with the heats of sublimation and the atom sizes of the impurity elements is considered.

read more

Citations
More filters
Book ChapterDOI

LASER ANNEALING OF HIGH DOSE P+, As+, B+, O+ AND C+ IMPLANTED Si

TL;DR: In this paper, a Q-switched ruby laser with an enrgy density of 1.2-1.5 J/cm 2 was used to implant p-and n-type (100) CZ Si.
Proceedings ArticleDOI

Ge shallow junction formation by As implantation and flash lamp annealing

TL;DR: Shallow, about 20 nm, depth n+/p junction of Ge was successfully fabricated by As+ implantation and FLA, although FLA parameters were not optimized yet.
Journal ArticleDOI

Doping of liquid phase epitaxial layers of InGaAsP with group IV elements

TL;DR: Germanium doping on InGaAsP epitaxial layers grown by liquid phase epitaxy produces n-type conduction with a net distribution coefficient k Ge ≈ 5 × 10 -3 as mentioned in this paper.
Journal ArticleDOI

Effects of heat treatment on epitaxial silicon solar cells on metallurgical silicon substrates

TL;DR: In this paper, large-area solar cells with an air mass one efficiency of about 9% were prepared by depositing a p-n junction structure onto the metallurgical silicon substrate.
References
More filters
Journal ArticleDOI

Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and Phosphorus

TL;DR: In this paper, it was shown that at high temperatures, the electron and hole mobilities of pure silicon alloys are independent of temperature, and at lower temperatures scattering by both ionized and neutral impurity centers contribute, and the mobility is largest for the more pure samples.
Journal ArticleDOI

Chemical interactions among defects in germanium and silicon

TL;DR: In this article, the authors present a blend of theory and experiment, and describe developments in this field during the past few years, including acid-base neutralization, complex ion formation, and ion pairing.
Journal ArticleDOI

Properties of Gold-Doped Silicon

TL;DR: In this article, the acceptor level is measured in $p$-type silicon as 0.62 ev from the valence band, giving a value of band gap consistent with previous measurements by other methods.
Journal ArticleDOI

Über Zweistoffsysteme mit Germanium. I. Germanium/Aluminium, Germanium/Zinn und Germanium/Silicium

TL;DR: In this paper, die Untersuchung von Systemen, die Halbmetalle enthalten, f¨r die Aufklarung feinerer Affinitatswirkungen von Bedeutung ist.
Related Papers (5)