scispace - formally typeset
Journal ArticleDOI

Solid solubilities of impurity elements in germanium and silicon

F. A. Trumbore
- 01 Jan 1960 - 
- Vol. 39, Iss: 1, pp 205-233
Reads0
Chats0
TLDR
In this paper, the available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves.
Abstract
The available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves. New solubility data are presented for the lead-germanium, zinc-germanium, indium-germanium, antimony-silicon, gallium-silicon and aluminum-silicon systems. The correlation of the solid solubilities with the heats of sublimation and the atom sizes of the impurity elements is considered.

read more

Citations
More filters
Dissertation

Molten Salt Electrodeposition of Silicon in Cu-Si

TL;DR: In this paper, the electrodeposition of Si from a cryolite-based melt was investigated as a possible solution to the high price of solar grade silicon has been one of the barriers against photovoltaic industry achieving its much anticipated growth.
Journal ArticleDOI

Light emission from silicon with tin-containing nanocrystals

TL;DR: In this article, the nanocrystal density and average diameters were determined by scanning transmission-electron microscopy to ~ 10−17 cm−3 and 5−5 nm, respectively.
Journal ArticleDOI

Silicon solar cells produced by corona discharge

TL;DR: In this article, a continuous gaseous discharge operating in the corona mode is used to produce p-n junction silicon solar cells, which is applicable to the production of p on n or n on p structures.
Journal ArticleDOI

Doping of epitaxial silicon

TL;DR: In this article, the observed temperature dependence of the doping concentration of As and P in epitaxial layers of Si is reviewed and the basis of a possible alternative interpretation is indicated.
Journal ArticleDOI

Enabling n-type polycrystalline Ge junctionless FinFET of low thermal budget by in situ doping of channel and visible pulsed laser annealing

TL;DR: A low-thermal-budget n-type polycrystalline Ge (poly-Ge) channel that was prepared by plasma in-situ-doped nanocrystalline ge (nc-Ge), and visible pulsed laser annealing exhibits a high electrically active concentration of 2 × 1019 cm−3 and a narrow Raman FWHM of 3.9 cm −1 as mentioned in this paper.
References
More filters
Journal ArticleDOI

Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and Phosphorus

TL;DR: In this paper, it was shown that at high temperatures, the electron and hole mobilities of pure silicon alloys are independent of temperature, and at lower temperatures scattering by both ionized and neutral impurity centers contribute, and the mobility is largest for the more pure samples.
Journal ArticleDOI

Chemical interactions among defects in germanium and silicon

TL;DR: In this article, the authors present a blend of theory and experiment, and describe developments in this field during the past few years, including acid-base neutralization, complex ion formation, and ion pairing.
Journal ArticleDOI

Properties of Gold-Doped Silicon

TL;DR: In this article, the acceptor level is measured in $p$-type silicon as 0.62 ev from the valence band, giving a value of band gap consistent with previous measurements by other methods.
Journal ArticleDOI

Über Zweistoffsysteme mit Germanium. I. Germanium/Aluminium, Germanium/Zinn und Germanium/Silicium

TL;DR: In this paper, die Untersuchung von Systemen, die Halbmetalle enthalten, f¨r die Aufklarung feinerer Affinitatswirkungen von Bedeutung ist.
Related Papers (5)