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Journal ArticleDOI

Solid solubilities of impurity elements in germanium and silicon

F. A. Trumbore
- 01 Jan 1960 - 
- Vol. 39, Iss: 1, pp 205-233
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TLDR
In this paper, the available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves.
Abstract
The available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves. New solubility data are presented for the lead-germanium, zinc-germanium, indium-germanium, antimony-silicon, gallium-silicon and aluminum-silicon systems. The correlation of the solid solubilities with the heats of sublimation and the atom sizes of the impurity elements is considered.

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Journal ArticleDOI

Silicide contacts for shallow junction devices

M. Wittmer
- 09 Sep 1983 - 
TL;DR: In this article, the miniaturization of integrated circuit devices necessitates modification of the present design and fabrication of their electrical contacts, and the requirements for contacts to sshallow junction devices are listed.
Journal ArticleDOI

Hybrid Laser Activation of Highly Concentrated Bi Donors in Wire-δ-Doped Silicon

TL;DR: In this paper, a serial combination of laser exposure and furnace annealing is demonstrated to activate Bi donors that are wire-δ-doped in Si. The photoluminescence reveals that the dense Bi atoms are activated so efficiently that an impurity band develops upon rapid radiation heating of the focused area close to the melting point.
Journal ArticleDOI

GeAs as a novel arsenic dimer source for n‐type doping of Ge grown by molecular beam epitaxy

TL;DR: In this article, the electron concentration in the arsenic-doped Ge films depends on the GeAs cell temperature with an activation energy of 2.5 eV, which coincides with the arsenic dimer beam flux generated from GeAs.
Proceedings ArticleDOI

Doped Silicon Temperature Compensation of Surface Acoustic Wave Devices

TL;DR: In this article, doped silicon is employed as the temperature compensating material while a thin-film piezoelectric ScAIN is employed for actuation for SAW resonators with various inplane orientations under different temperatures.
References
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Journal ArticleDOI

Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and Phosphorus

TL;DR: In this paper, it was shown that at high temperatures, the electron and hole mobilities of pure silicon alloys are independent of temperature, and at lower temperatures scattering by both ionized and neutral impurity centers contribute, and the mobility is largest for the more pure samples.
Journal ArticleDOI

Chemical interactions among defects in germanium and silicon

TL;DR: In this article, the authors present a blend of theory and experiment, and describe developments in this field during the past few years, including acid-base neutralization, complex ion formation, and ion pairing.
Journal ArticleDOI

Properties of Gold-Doped Silicon

TL;DR: In this article, the acceptor level is measured in $p$-type silicon as 0.62 ev from the valence band, giving a value of band gap consistent with previous measurements by other methods.
Journal ArticleDOI

Über Zweistoffsysteme mit Germanium. I. Germanium/Aluminium, Germanium/Zinn und Germanium/Silicium

TL;DR: In this paper, die Untersuchung von Systemen, die Halbmetalle enthalten, f¨r die Aufklarung feinerer Affinitatswirkungen von Bedeutung ist.
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