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Journal ArticleDOI

Solid solubilities of impurity elements in germanium and silicon

F. A. Trumbore
- 01 Jan 1960 - 
- Vol. 39, Iss: 1, pp 205-233
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TLDR
In this paper, the available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves.
Abstract
The available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves. New solubility data are presented for the lead-germanium, zinc-germanium, indium-germanium, antimony-silicon, gallium-silicon and aluminum-silicon systems. The correlation of the solid solubilities with the heats of sublimation and the atom sizes of the impurity elements is considered.

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Citations
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SiSn mediated formation of polycrystalline SiGeSn

TL;DR: In this article , a polycrystalline thin layers were grown using Sn nanodots as crystal nuclei, and the substitutional Sn content was estimated as high as 1.5%.
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Si Electrochemical Liquid Phase Epitaxy: Low-Temperature Growth of Hyperdoped Epitaxial Si Films

TL;DR: In this article , a hybrid approach that combined elements of conventional electrodeposition and traditional liquid phase epitaxy was demonstrated as a hybrid method to realize crystalline Si films suitable for optoelectronic applications.
Proceedings ArticleDOI

Can vacancies and their complexes with nonmetals prevent the lifetime reaching its intrinsic limit in silicon

TL;DR: In this article, the authors used photoluminescence imaging, lifetime spectroscopy, and defect imaging along the ingot to help identify the defect(s) in Czochralski and Floating Zone (FZ) n-type silicon wafers.
Journal ArticleDOI

Low-Temperature Solid-Phase Epitaxy of Defect-Free Aluminum p+-doped Silicon for Nanoscale Device Applications

TL;DR: In this paper, a solid phase epitaxy (SPE) technique was developed to grow p+ aluminum-doped crystalline Si in a fully CMOS compatible process, where the location and dimensions are well controlled, even in the sub-100 nm range.
Journal ArticleDOI

Correlation of solubilities of various elements in silicon

TL;DR: In this paper, a relation which, dans un processus donne impliquant les defauts dans les solides (defaut de formation, diffusion, solution d'impurete, etc.), relie l'enthalpie a l'entropie correspondante is tablissement.
References
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Journal ArticleDOI

Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and Phosphorus

TL;DR: In this paper, it was shown that at high temperatures, the electron and hole mobilities of pure silicon alloys are independent of temperature, and at lower temperatures scattering by both ionized and neutral impurity centers contribute, and the mobility is largest for the more pure samples.
Journal ArticleDOI

Chemical interactions among defects in germanium and silicon

TL;DR: In this article, the authors present a blend of theory and experiment, and describe developments in this field during the past few years, including acid-base neutralization, complex ion formation, and ion pairing.
Journal ArticleDOI

Properties of Gold-Doped Silicon

TL;DR: In this article, the acceptor level is measured in $p$-type silicon as 0.62 ev from the valence band, giving a value of band gap consistent with previous measurements by other methods.
Journal ArticleDOI

Über Zweistoffsysteme mit Germanium. I. Germanium/Aluminium, Germanium/Zinn und Germanium/Silicium

TL;DR: In this paper, die Untersuchung von Systemen, die Halbmetalle enthalten, f¨r die Aufklarung feinerer Affinitatswirkungen von Bedeutung ist.
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