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Journal ArticleDOI

Solid solubilities of impurity elements in germanium and silicon

F. A. Trumbore
- 01 Jan 1960 - 
- Vol. 39, Iss: 1, pp 205-233
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TLDR
In this paper, the available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves.
Abstract
The available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves. New solubility data are presented for the lead-germanium, zinc-germanium, indium-germanium, antimony-silicon, gallium-silicon and aluminum-silicon systems. The correlation of the solid solubilities with the heats of sublimation and the atom sizes of the impurity elements is considered.

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Citations
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Groups III and V impurity solubilities in silicon due to laser, flash, and solid-phase-epitaxial-regrowth anneals

TL;DR: In this article, the impurity solubilities of groups III and V elements in silicon resulting from laser anneals, flash anneal, and solid phase-epitaxial regrowth were studied.
Journal ArticleDOI

Impurities Removal from Metallurgical-Grade Silicon by Combined Sn-Si and Al-Si Refining Processes

TL;DR: In this article, the purification of metallurgical-grade silicon (MG-Si) by combined solvent refining processes has been studied, and the removal mechanism of impurities was explored.
Journal ArticleDOI

Spin-On Organic Polymer Dopants for Silicon

TL;DR: In this article, a new class of spin-on dopants composed of organic, dopant-containing polymers is introduced, which offer a hybrid between conventional inorganic spin-ons and a recently developed organic monolayer doping technique that affords unprecedented control and uniformity of doping profiles.
Journal ArticleDOI

Change of the electron effective mass in extremely heavily doped n-type Si obtained by ion implantation and laser annealing

TL;DR: In this article, a new relation between free carrier effective mass (m ∗ ) and carrier concentration (10 19 −5 × 10 21 cm -3 ) was obtained, and the value of m ∗ increases significantly with the increase of carrier concentration, when carrier concentration exceeds the threshold of 10 −5 cm −3, and the result is discussed in relation to the occupation of electrons in a new valley of the conduction band.
Journal ArticleDOI

Purification of metallurgical grade Si combining Si–Sn solvent refining with slag treatment

TL;DR: In this article, a low-cost metallurgical route for solar grade silicon (SOG-Si) production, a novel process sequence of slag treatment and solidification refining using Si-Sn solvents under induction heating, followed by acid leaching was investigated.
References
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Journal ArticleDOI

Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and Phosphorus

TL;DR: In this paper, it was shown that at high temperatures, the electron and hole mobilities of pure silicon alloys are independent of temperature, and at lower temperatures scattering by both ionized and neutral impurity centers contribute, and the mobility is largest for the more pure samples.
Journal ArticleDOI

Chemical interactions among defects in germanium and silicon

TL;DR: In this article, the authors present a blend of theory and experiment, and describe developments in this field during the past few years, including acid-base neutralization, complex ion formation, and ion pairing.
Journal ArticleDOI

Properties of Gold-Doped Silicon

TL;DR: In this article, the acceptor level is measured in $p$-type silicon as 0.62 ev from the valence band, giving a value of band gap consistent with previous measurements by other methods.
Journal ArticleDOI

Über Zweistoffsysteme mit Germanium. I. Germanium/Aluminium, Germanium/Zinn und Germanium/Silicium

TL;DR: In this paper, die Untersuchung von Systemen, die Halbmetalle enthalten, f¨r die Aufklarung feinerer Affinitatswirkungen von Bedeutung ist.
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