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Journal ArticleDOI

Solid solubilities of impurity elements in germanium and silicon

F. A. Trumbore
- 01 Jan 1960 - 
- Vol. 39, Iss: 1, pp 205-233
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TLDR
In this paper, the available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves.
Abstract
The available data on solid solubilities of impurity elements in germanium and silicon are summarized in the form of solidus or solvus curves. New solubility data are presented for the lead-germanium, zinc-germanium, indium-germanium, antimony-silicon, gallium-silicon and aluminum-silicon systems. The correlation of the solid solubilities with the heats of sublimation and the atom sizes of the impurity elements is considered.

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Citations
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Avalanche breakdown in silicon diffused junctions

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Thermodynamics of solid silicon equilibrated with Si–Al–Cu liquid alloys

TL;DR: In this article, the activity coefficient of copper in solid silicon at infinite dilution relative to the pure solid state was determined as follows R T ln γ Cu ( s ) in solid Si 0 = 166, 000 ( ± 3500 ) − 47.6 ( ± 2.8 ) T ( J / mol ) ( 975 − 1602 K )
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Fabrication of Reproducible, Integration‐Compatible Hybrid Molecular/Si Electronics

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Production of extreme-purity aluminum and silicon by fractional crystallization processing

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Molecular beam epitaxy of silicon: Effects of heavy Sb doping

TL;DR: In this article, the authors studied the effect of heavy Sb doping on the performance of undoped and antimony-doped Si films and found that the layer quality is drastically degraded with respect to defects, mobility and lateral doping profile.
References
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Journal ArticleDOI

Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and Phosphorus

TL;DR: In this paper, it was shown that at high temperatures, the electron and hole mobilities of pure silicon alloys are independent of temperature, and at lower temperatures scattering by both ionized and neutral impurity centers contribute, and the mobility is largest for the more pure samples.
Journal ArticleDOI

Chemical interactions among defects in germanium and silicon

TL;DR: In this article, the authors present a blend of theory and experiment, and describe developments in this field during the past few years, including acid-base neutralization, complex ion formation, and ion pairing.
Journal ArticleDOI

Properties of Gold-Doped Silicon

TL;DR: In this article, the acceptor level is measured in $p$-type silicon as 0.62 ev from the valence band, giving a value of band gap consistent with previous measurements by other methods.
Journal ArticleDOI

Über Zweistoffsysteme mit Germanium. I. Germanium/Aluminium, Germanium/Zinn und Germanium/Silicium

TL;DR: In this paper, die Untersuchung von Systemen, die Halbmetalle enthalten, f¨r die Aufklarung feinerer Affinitatswirkungen von Bedeutung ist.
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