Institution
Mitsubishi
Company•Tokyo, Japan•
About: Mitsubishi is a company organization based out in Tokyo, Japan. It is known for research contribution in the topics: Signal & Layer (electronics). The organization has 53115 authors who have published 54821 publications receiving 870150 citations. The organization is also known as: Mitsubishi Group of Companies & Mitsubishi Companies.
Topics: Signal, Layer (electronics), Semiconductor memory, Electrode, Voltage
Papers published on a yearly basis
Papers
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TL;DR: To increase the sensitivity and to depress the nonspecific binding in biochemical assays, a new core-shell-type fluorescent nanosphere covalently conjugated with antibody was prepared and was used for the solid-phase time-resolved fluorometric immunoassay of AFP.
Abstract: To increase the sensitivity and to depress the nonspecific binding in biochemical assays, a new core−shell-type fluorescent nanosphere (106.7 nm) covalently conjugated with antibody was prepared. The core−shell-type nanosphere was constructed by dispersion radical polymerization of styrene in the presence of heterotelechelic poly(ethylene glycol) (PEG) macromonomer, which has a polymerizable vinylbenzyl group at one end and a primary amino group at the other chain end and used as well as a surfactant. The resulting nanosphere had PEG tethered chains on the surface, which possesses a primary amino group at the distal end of the PEG chain (NH2 nanosphere). The fluorescent NH2 nanosphere was constructed by incorporating fluorescent europium chelates with β-diketonate ligands in the core of the NH2 nanosphere by means of a physical entrapment method. The primary amino groups on the fluorescent NH2 nanosphere were then converted to maleimide groups using a hetero cross-linker. The resulting nanosphere had male...
123 citations
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10 Nov 1996TL;DR: A new metric for measuring the extent of design verification provided by a set of functional simulation vectors is proposed, which can be used uniformly for all designs and computes observability information to determine whether effects of errors that are activated by the program stimuli can be observed at the circuit outputs.
Abstract: Functional simulation is the most widely used method for design verification. At various levels of abstraction, e.g., behavioral, register-transfer level and gate level, the designer simulates the design using a large number of vectors attempting to debug and verify the design. A major problem with functional simulation is the lack of good metrics and tools to evaluate the quality of a set of functional vectors. Metrics used currently are based on instruction counts and are quite simplistic. Designers are forced to use ad-hoc methods to terminate functional simulation, e.g., CPU time limitations, We propose a new metric for measuring the extent of design verification provided by a set of functional simulation vectors. This metric is universal, and can be used uniformly for all designs. Our metric computes observability information to determine whether effects of errors that are activated by the program stimuli can be observed at the circuit outputs. We provide preliminary experimental evidence that supports the validity of the proposed metric. We believe that using this metric in design verification will result in higher-quality functional tests and improved correctness checking.
123 citations
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28 Jul 1997TL;DR: In this article, a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound, (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium, and (E) an organic CARO amine salt; as well as a process for producing semiconductor devices by forming a resist pattern on a substrate equipped on the surface with
Abstract: There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.
123 citations
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27 Feb 2009
TL;DR: In this article, a mathematical modeling method for wireless networks is designed to take into account propagation effects and interference from unwanted transmissions, and it is shown that the model can be used to model wireless networks.
Abstract: This mathematical modeling method for wireless networks is designed to take into account propagation effects and interference from unwanted transmissions.
123 citations
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TL;DR: For anaerobic treatment of municipal wastewater at lower temperatures, hydrogenotrophic methanogens play an important role in COD removal and D-CH(4) can be collected to reduce greenhouse gas emissions and avoid wastage of energy resources.
123 citations
Authors
Showing all 53117 results
Name | H-index | Papers | Citations |
---|---|---|---|
Thomas S. Huang | 146 | 1299 | 101564 |
Kazunari Domen | 130 | 908 | 77964 |
Kozo Kaibuchi | 129 | 493 | 60461 |
Yoshimi Takai | 122 | 680 | 61478 |
William T. Freeman | 113 | 432 | 69007 |
Tadayuki Takahashi | 112 | 932 | 57501 |
Takashi Saito | 112 | 1041 | 52937 |
H. Vincent Poor | 109 | 2116 | 67723 |
Qi Tian | 96 | 1030 | 41010 |
Andreas F. Molisch | 96 | 777 | 47530 |
Takeshi Sakurai | 95 | 492 | 43221 |
Akira Kikuchi | 93 | 412 | 28893 |
Markus Gross | 91 | 588 | 32881 |
Eiichi Nakamura | 90 | 845 | 31632 |
Michael Wooldridge | 87 | 543 | 50675 |