Institution
Samsung
Company•Seoul, South Korea•
About: Samsung is a company organization based out in Seoul, South Korea. It is known for research contribution in the topics: Layer (electronics) & Signal. The organization has 134067 authors who have published 163691 publications receiving 2057505 citations. The organization is also known as: Samsung Group & Samsung chaebol.
Papers published on a yearly basis
Papers
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24 May 2001TL;DR: An MPEG2 moving picture and encoding/decoding system to provide digital copy protection of digital moving picture data is described in this paper. But the MPEG2 watermark inserter uses a digital watermark to embed watermark information on a frequency domain of the discrete cosine transformed video input signal.
Abstract: An MPEG2 moving picture and encoding/decoding system to provide digital copy protection of digital moving picture data. The MPEG2 moving picture encoder discrete cosine transforms a video input signal and uses a digital watermark inserter to embed digital watermark information on a frequency domain of the discrete cosine transformed video input signal. The MPEG2 moving picture decoder receives the encoded video output signal from the MPEG2 moving picture encoder and removes the embedded visual watermark information to locally decode the encoded video signal.
168 citations
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12 Oct 2004TL;DR: In this article, a three-color image data set comprising C1, C2, C3 and W colors was converted to a four-color primary set with one white primary.
Abstract: Systems and methods are disclosed to effect conversion of a three color primary image data set to a multiple color primary set in which one of the primaries is white. One method converts a three-color image data set comprising C1, C2, and C3 colors into a four-color image data set comprising C1, C2, C3 and W colors.
168 citations
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21 Mar 2014TL;DR: In this article, a display apparatus includes a display unit, a signal processor, a communicator, and a controller, which is configured to adjust a plurality of functions of the display apparatus.
Abstract: A display apparatus includes: a display unit; a signal processor which is configured to process an image signal to be displayed as an image on the display unit; a communicator which is configured to communicate with an external network; and a controller which is configured to perform an initial setup service provide a user with a plurality of setup stages for adjusting a plurality of functions of the display apparatus, deduce an installation region of the display apparatus based on network information when the network information for the communicator to communicate with the external network is setup in execution of the initial setup service, and automatically perform at least part of the setup stages based on information on the deduced installation region
168 citations
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15 Jul 2005TL;DR: In this paper, a thin film structure is formed that includes hafnium silicon oxide using an atomic layer deposition process, and a second thin film including silicon oxide is formed on the first thin film by chemically reacting the second oxidant with the first portion of the second reactant.
Abstract: A thin film structure is formed that includes hafnium silicon oxide using an atomic layer deposition process. A first reactant including tetrakis ethyl methyl amino hafnium (TEMAH) is introduced onto a substrate. A first portion of the first reactant is chemisorbed to the substrate, whereas a second portion of the first reactant is physorbed to the first portion of the first reactant. A first oxidant is provided onto the substrate. A first thin film including hafnium oxide is formed on the substrate by chemically reacting the first oxidant with the first portion of the first reactant. A second reactant including amino propyl tri ethoxy silane (APTES) is introduced onto the first thin film. A first portion of the second reactant is chemisorbed to the first thin film, whereas a second portion of the second reactant is physorbed to the first portion of the second reactant. A second oxidant is provided onto the first thin film. A second thin film including silicon oxide is formed on the first thin film by chemically reacting the second oxidant with the first portion of the second reactant.
168 citations
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22 Nov 2011168 citations
Authors
Showing all 134111 results
Name | H-index | Papers | Citations |
---|---|---|---|
Yi Cui | 220 | 1015 | 199725 |
Hyun-Chul Kim | 176 | 4076 | 183227 |
Hannes Jung | 159 | 2069 | 125069 |
Yongsun Kim | 156 | 2588 | 145619 |
Yu Huang | 136 | 1492 | 89209 |
Robert W. Heath | 128 | 1049 | 73171 |
Shuicheng Yan | 123 | 810 | 66192 |
Shi Xue Dou | 122 | 2028 | 74031 |
Young Hee Lee | 122 | 1168 | 61107 |
Alan L. Yuille | 119 | 804 | 78054 |
Yang-Kook Sun | 117 | 781 | 58912 |
Sang Yup Lee | 117 | 1005 | 53257 |
Guoxiu Wang | 117 | 654 | 46145 |
Richard G. Baraniuk | 107 | 770 | 57550 |
Jef D. Boeke | 106 | 456 | 52598 |