Institution
Samsung
Company•Seoul, South Korea•
About: Samsung is a company organization based out in Seoul, South Korea. It is known for research contribution in the topics: Layer (electronics) & Signal. The organization has 134067 authors who have published 163691 publications receiving 2057505 citations. The organization is also known as: Samsung Group & Samsung chaebol.
Papers published on a yearly basis
Papers
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01 Jun 2009TL;DR: In this article, the authors presented the world largest flexible full color 6.5-inch active matrix organic light emitting diode (AMOLED) display with top emission mode on plastic film.
Abstract: The world largest flexible full color 6.5-inch active matrix organic light emitting diode (AMOLED) display with top emission mode on plastic film is demonstrated. The active matrix backplanes were fabricated using metal oxide thin film transistors (TFTs). The n-channel metal oxide TFTs on plastic film exhibited field-effect mobility of 17.8 cm2/Vs, threshold voltage of 0.4 V, on/off ratio of 1.1× 108, and subthreshold slope of 0.34 V/dec. These TFT performance characteristics made it possible to integrate scan driver circuit, demux switching and compensation circuit on the panel. Bending tests were performed with TFT backplane samples to determine critical curvature radius to which the panel can be bent without TFT performance degradation. The results were compared with the calculations that took into account thicknesses and mechanical constants of flexible substrate and of thin-film layers in AMOLED device.
997 citations
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TL;DR: In this paper, a size-selective quantum dot patterning technique that involves kinetically controlling the nanotransfer process without a solvent is described, which allows fabrication of a 4-inch (or larger) thin-film transistor display with high colour purity and extremely high resolution.
Abstract: Scientists describe a size-selective quantum dot patterning technique that involves kinetically controlling the nanotransfer process without a solvent. The resulting printed quantum dot films exhibit excellent morphology and a well-ordered quantum dot structure. This technique allows fabrication of a 4-inch (or larger) thin-film transistor display with high colour purity and extremely high resolution.
992 citations
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01 May 2008TL;DR: In this paper, GIZO TFTs with high mobility of 2.6 cm2/Vs and threshold voltage standard deviation of 0.7V which is comparable to that of a-Si TFT are fabricated.
Abstract: We successfully fabricated GIZO (Ga2O3-In2O3-ZnO) TFTs with high mobility of 2.6 cm2/Vs and threshold voltage standard deviation of 0.7V which is comparable to that of a-Si TFTs. Because conventional 5 mask process and bottom gate TFT structure of back channel etch type with channel length of 5 μm is used, it is expected to be transferred to mass production line in near future. Also we report the dependency of threshold voltage on the post process after the back surface of GIZO is exposed and suggest the effective method for controlling the threshold voltage of amorphous GIZO TFTs. Finally we demonstrate 4 inch QVGA AMOLED display driven by GIZO TFTs.
990 citations
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University of California, San Diego1, Université de Montréal2, Curie Institute3, French Institute of Health and Medical Research4, Versailles Saint-Quentin-en-Yvelines University5, Instituto Português de Oncologia Francisco Gentil6, University of Milan7, Samsung8, Cliniques Universitaires Saint-Luc9, Université catholique de Louvain10, Fox Chase Cancer Center11, Yale University12, Merck & Co.13, Institute of Cancer Research14, The Royal Marsden NHS Foundation Trust15
TL;DR: The clinically meaningful prolongation of overall survival and favourable safety profile of pembrolizumab in patients with recurrent or metastatic head and neck squamous cell carcinoma support the further evaluation of p embrolizUMab as a monotherapy and as part of combination therapy in earlier stages of disease.
984 citations
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TL;DR: A solution-processing technique in which lattice strain is used to increase charge carrier mobilities by introducing greater electron orbital overlap between the component molecules should aid the development of high-performance, low-cost organic semiconducting devices.
Abstract: A solution-processing method known as solution shearing is used to introduce lattice strain to organic semiconductors, thus improving charge carrier mobility. Solution-processed organic semiconductors show great promise for application in cheap and flexible electronic devices, but generally suffer from greatly reduced electronic performance — most notably charge-carrier mobilities — compared with their inorganic counterparts. Borrowing a trick from the inorganic semiconductor community, Giri et al. show how the introduction of strain into an organic semiconductor, through a simple solution-processing technique, modifies the molecular packing within the material and hence its electronic performance. For one material studied, the preparation of a strained structure is shown to more than double the charge-carrier mobility. Circuits based on organic semiconductors are being actively explored for flexible, transparent and low-cost electronic applications1,2,3,4,5. But to realize such applications, the charge carrier mobilities of solution-processed organic semiconductors must be improved. For inorganic semiconductors, a general method of increasing charge carrier mobility is to introduce strain within the crystal lattice6. Here we describe a solution-processing technique for organic semiconductors in which lattice strain is used to increase charge carrier mobilities by introducing greater electron orbital overlap between the component molecules. For organic semiconductors, the spacing between cofacially stacked, conjugated backbones (the π–π stacking distance) greatly influences electron orbital overlap and therefore mobility7. Using our method to incrementally introduce lattice strain, we alter the π–π stacking distance of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS-pentacene) from 3.33 A to 3.08 A. We believe that 3.08 A is the shortest π–π stacking distance that has been achieved in an organic semiconductor crystal lattice (although a π–π distance of 3.04 A has been achieved through intramolecular bonding8,9,10). The positive charge carrier (hole) mobility in TIPS-pentacene transistors increased from 0.8 cm2 V−1 s−1 for unstrained films to a high mobility of 4.6 cm2 V−1 s−1 for a strained film. Using solution processing to modify molecular packing through lattice strain should aid the development of high-performance, low-cost organic semiconducting devices.
965 citations
Authors
Showing all 134111 results
Name | H-index | Papers | Citations |
---|---|---|---|
Yi Cui | 220 | 1015 | 199725 |
Hyun-Chul Kim | 176 | 4076 | 183227 |
Hannes Jung | 159 | 2069 | 125069 |
Yongsun Kim | 156 | 2588 | 145619 |
Yu Huang | 136 | 1492 | 89209 |
Robert W. Heath | 128 | 1049 | 73171 |
Shuicheng Yan | 123 | 810 | 66192 |
Shi Xue Dou | 122 | 2028 | 74031 |
Young Hee Lee | 122 | 1168 | 61107 |
Alan L. Yuille | 119 | 804 | 78054 |
Yang-Kook Sun | 117 | 781 | 58912 |
Sang Yup Lee | 117 | 1005 | 53257 |
Guoxiu Wang | 117 | 654 | 46145 |
Richard G. Baraniuk | 107 | 770 | 57550 |
Jef D. Boeke | 106 | 456 | 52598 |