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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

Adrian M. Ionescu, +1 more
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 329-337
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TLDR
Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Abstract
Power dissipation is a fundamental problem for nanoelectronic circuits. Scaling the supply voltage reduces the energy needed for switching, but the field-effect transistors (FETs) in today's integrated circuits require at least 60 mV of gate voltage to increase the current by one order of magnitude at room temperature. Tunnel FETs avoid this limit by using quantum-mechanical band-to-band tunnelling, rather than thermal injection, to inject charge carriers into the device channel. Tunnel FETs based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal-oxide-semiconductor (CMOS) transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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Citations
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Journal ArticleDOI

Optimization of Hetero-Gate-Dielectric Tunnel FET for Label-Free Detection and Identification of Biomolecules

TL;DR: For each aforementioned sensitivity parameter, it is found that the proposed DHGDM-TFET biosensor device outperforms the rest two devices, proving the superiority in sensing action.
Journal ArticleDOI

Dual‐channel trench‐gate tunnel FET for improved ON‐current and subthreshold swing

TL;DR: In this article, a dual-channel trench-gate tunnel field effect transistor (DCTG-TFET) is proposed and investigated to reduce channel resistance and tunnelling width for an appreciable increase in ON-state current.
Journal ArticleDOI

A simulation-based proposed high-k heterostructure AlGaAs/Si junctionless n-type tunnel FET

TL;DR: In this article, a heterostructure junctionless tunnel field effect transistor (HJL-TFET) using AlGaAs/Si was proposed, which exhibits a high current in the range of 1.4 10 6 A/m, the off current remains as low as 9.1 10 14 A/ m. The proposed structure is simulated in Silvaco with different gate dielectric materials.
Journal ArticleDOI

A Graphene‐Based Filament Transistor with Sub‐10 mVdec−1 Subthreshold Swing

TL;DR: In this paper, a new kind of steep slope transistor named filament transistor is proposed with SS down to sub-10 mV dec−1. But at present, the integration of the ferroelectric materials with smaller hysteresis window is remained to be studied.
Journal ArticleDOI

Sub-5 nm monolayer black phosphorene tunneling transistors.

TL;DR: It is predicted that the on-state currents (I on) of the sub-5 nm ML BP TFETs will exceed those of the ML WTe2TFETs, which possess the highest I on among the transition-metal dichalcogenide family.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

TL;DR: By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Journal ArticleDOI

Low-Voltage Tunnel Transistors for Beyond CMOS Logic

TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.
Journal ArticleDOI

Double-Gate Tunnel FET With High- $\kappa$ Gate Dielectric

TL;DR: In this article, a double-gate tunnel field effect transistor (DG tunnel FET) with a high-kappa gate dielectric was proposed and validated using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average sub-threshold swing of 57 mV/dec, and a minimum point slope of 11 mV /dec.
Journal ArticleDOI

A theory of the electrical breakdown of solid dielectrics

TL;DR: In this paper, two distinct mechanisms have been suggested for the sudden increase of the number of electrons in an unfilled band, which occurs when the field strength passes a critical value, analogous to the electrical breakdown of gases.
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