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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

Adrian M. Ionescu, +1 more
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 329-337
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TLDR
Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Abstract
Power dissipation is a fundamental problem for nanoelectronic circuits. Scaling the supply voltage reduces the energy needed for switching, but the field-effect transistors (FETs) in today's integrated circuits require at least 60 mV of gate voltage to increase the current by one order of magnitude at room temperature. Tunnel FETs avoid this limit by using quantum-mechanical band-to-band tunnelling, rather than thermal injection, to inject charge carriers into the device channel. Tunnel FETs based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal-oxide-semiconductor (CMOS) transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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Citations
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Journal ArticleDOI

Overcoming Biomolecule Location-Dependent Sensitivity Degradation Through Point and Line Tunneling in Dielectric Modulated Biosensors

TL;DR: In this article, the utility of pocket tunnel field effect transistors (TFETs) for use as dielectric-modulated biosensor is reported, which can be further improved by lowering the pocket doping.
Journal ArticleDOI

Performance Enhancement of Nanowire Tunnel Field-Effect Transistor With Asymmetry-Gate Based on Different Screening Length

TL;DR: In this article, an asymmetric gate tunnel field effect transistor (AG-TFET) with a gate-all-around (GAA) structure in the source and a planar structure in drain is described.
Journal ArticleDOI

Analytical Modeling of a Triple Material Double Gate TFET with Hetero-Dielectric Gate Stack

TL;DR: In this article, an analytical model of a triple material double gate tunnel field effect transistor (TM-DG TFET) with hetero-dielectric gate oxide stack comprising of SiO2 and HfO2 was developed.
Journal ArticleDOI

Insights into the DC, RF/Analog and linearity performance of vertical tunneling based TFET for low-power applications

TL;DR: In this article, the concept of dual metal and double gate in Vertical TFET is presented to show the improvement of DC as well as analog/RF device performance standards due to enhanced gate modulation.
Journal ArticleDOI

Low-dimensional materials-based field-effect transistors

TL;DR: In this paper, a universal framework is provided to describe the recent progress in this advanced field and it includes discussions of novel materials, new device configurations and the wide variety of device applications.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

TL;DR: By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Journal ArticleDOI

Low-Voltage Tunnel Transistors for Beyond CMOS Logic

TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.
Journal ArticleDOI

Double-Gate Tunnel FET With High- $\kappa$ Gate Dielectric

TL;DR: In this article, a double-gate tunnel field effect transistor (DG tunnel FET) with a high-kappa gate dielectric was proposed and validated using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average sub-threshold swing of 57 mV/dec, and a minimum point slope of 11 mV /dec.
Journal ArticleDOI

A theory of the electrical breakdown of solid dielectrics

TL;DR: In this paper, two distinct mechanisms have been suggested for the sudden increase of the number of electrons in an unfilled band, which occurs when the field strength passes a critical value, analogous to the electrical breakdown of gases.
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