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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

Adrian M. Ionescu, +1 more
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 329-337
TLDR
Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Abstract
Power dissipation is a fundamental problem for nanoelectronic circuits. Scaling the supply voltage reduces the energy needed for switching, but the field-effect transistors (FETs) in today's integrated circuits require at least 60 mV of gate voltage to increase the current by one order of magnitude at room temperature. Tunnel FETs avoid this limit by using quantum-mechanical band-to-band tunnelling, rather than thermal injection, to inject charge carriers into the device channel. Tunnel FETs based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal-oxide-semiconductor (CMOS) transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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Citations
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Journal ArticleDOI

Analysis of Graphene Tunnel Field-Effect Transistors for Analog/RF Applications

TL;DR: In this paper, the electronic transport in zero bandgap graphene TFET (T-GFET) is studied through the selfconsistent solution of Schrodinger equation within ballistic nonequilibrium Green's function formalism, and 2-D Poisson's equation.
Journal ArticleDOI

A Comparative Study on Scaling Capabilities of Si and SiGe Nanoscale Double Gate Tunneling FETs

TL;DR: In this article, the authors investigated the performance of SiGe nanoscale double gate TFET device including low doped drain region and obtained the superior immunity of the proposed design against traps induced degradation in comparison to the conventional TFET structure.
Journal ArticleDOI

Impact of Strain on Tunneling Current and Threshold Voltage in III–V Nanowire TFETs

TL;DR: In this paper, a simulation study on the effects of different strain configurations on n-type III-V-based nanowire tunnel-FETs is presented, with the aim to determine optimal strain conditions to enhance device performance.
Proceedings ArticleDOI

Dual workfunction hetero gate dielectric tunnel field-effect transistor performance analysis

TL;DR: In this article, a study of DC and analog/RF response of dual work function hetero gate dielectric source pocket tunnel field effect transistor (DW HGD SP TFET) is presented, where source pocket is used to enhance the tunneling of charge carrier results in increment in ON-state current.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

TL;DR: By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Journal ArticleDOI

Low-Voltage Tunnel Transistors for Beyond CMOS Logic

TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.
Journal ArticleDOI

Double-Gate Tunnel FET With High- $\kappa$ Gate Dielectric

TL;DR: In this article, a double-gate tunnel field effect transistor (DG tunnel FET) with a high-kappa gate dielectric was proposed and validated using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average sub-threshold swing of 57 mV/dec, and a minimum point slope of 11 mV /dec.
Journal ArticleDOI

A theory of the electrical breakdown of solid dielectrics

TL;DR: In this paper, two distinct mechanisms have been suggested for the sudden increase of the number of electrons in an unfilled band, which occurs when the field strength passes a critical value, analogous to the electrical breakdown of gases.
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