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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

Adrian M. Ionescu, +1 more
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 329-337
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TLDR
Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Abstract
Power dissipation is a fundamental problem for nanoelectronic circuits. Scaling the supply voltage reduces the energy needed for switching, but the field-effect transistors (FETs) in today's integrated circuits require at least 60 mV of gate voltage to increase the current by one order of magnitude at room temperature. Tunnel FETs avoid this limit by using quantum-mechanical band-to-band tunnelling, rather than thermal injection, to inject charge carriers into the device channel. Tunnel FETs based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal-oxide-semiconductor (CMOS) transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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Citations
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Journal ArticleDOI

Performance Analysis of a Charge Plasma Junctionless Nanotube Tunnel FET Including the Negative Capacitance Effect

TL;DR: In this article, the negative capacitance phenomenon was used in a charge-plasma junctionless nanotube tunnel field effect transistor (CP-JLTFET) to reduce the power supply voltage and minimise the power dissipation.
Journal ArticleDOI

Fast Yet Quantum-Efficient Few-Layer Vertical MoS2 Photodetectors

TL;DR: In this article, a vertical few layer molybdenum disulfide (MoS2) photodevices with semitransparent metallic electrodes is proposed for photocurrent generation.
Proceedings ArticleDOI

PROCEED: A pareto optimization-based circuit-level evaluator for emerging devices

TL;DR: A new framework, PROCEED, and metrics for accurate device-circuit co-evaluation through proper optimization of digital circuit benchmarks are proposed and it is deployed to assess novel tunneling transistors (TFETs) compared to conventional CMOS.
Journal ArticleDOI

Heat capacity and electrical conductivity of plasmon excitations

TL;DR: In this paper, the heat capacity and electrical conductivity of plasmon excitations in an arbitrary degenerate electron gas were calculated by using the linearized Schrodinger-Poisson model.
Journal ArticleDOI

Junctionless nanowire TFET with built-in N-P-N bipolar action: Physics and operational principle

TL;DR: In this paper, a junctionless nanowire tunneling FET (JN-TFET) was proposed, in which the source region was divided into an n+ as well as a p+ type region.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

TL;DR: By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Journal ArticleDOI

Low-Voltage Tunnel Transistors for Beyond CMOS Logic

TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.
Journal ArticleDOI

Double-Gate Tunnel FET With High- $\kappa$ Gate Dielectric

TL;DR: In this article, a double-gate tunnel field effect transistor (DG tunnel FET) with a high-kappa gate dielectric was proposed and validated using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average sub-threshold swing of 57 mV/dec, and a minimum point slope of 11 mV /dec.
Journal ArticleDOI

A theory of the electrical breakdown of solid dielectrics

TL;DR: In this paper, two distinct mechanisms have been suggested for the sudden increase of the number of electrons in an unfilled band, which occurs when the field strength passes a critical value, analogous to the electrical breakdown of gases.
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