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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

Adrian M. Ionescu, +1 more
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 329-337
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TLDR
Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Abstract
Power dissipation is a fundamental problem for nanoelectronic circuits. Scaling the supply voltage reduces the energy needed for switching, but the field-effect transistors (FETs) in today's integrated circuits require at least 60 mV of gate voltage to increase the current by one order of magnitude at room temperature. Tunnel FETs avoid this limit by using quantum-mechanical band-to-band tunnelling, rather than thermal injection, to inject charge carriers into the device channel. Tunnel FETs based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal-oxide-semiconductor (CMOS) transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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Citations
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Journal ArticleDOI

Ultra‐Steep‐Slope High‐Gain MoS2 Transistors with Atomic Threshold‐Switching Gate

TL;DR: With the ultra-steep SS, the RG-FETs can be readily employed to construct logic inverter with an ultra-high gain ≈2000, indicating exciting potential for future low-power electronics and monolithic integration.
Proceedings ArticleDOI

Comparison between vertical silicon NW-TFET and NW-MOSFETfrom analog point of view

TL;DR: In this article, a comparison of the analog performance between vertical silicon Nanowires Tunnel Field Effect Transistors (NW-TFETs) and nanowires MOSFETs was performed mainly focusing on the basic analog characteristics at room and high temperatures for the first time.
Journal ArticleDOI

Vertical Cladding Layer-Based Doping-Less Tunneling Field Effect Transistor: A Novel Low-Power High-Performance Device

TL;DR: In this article , a novel vertical doping-less tunnel field effect transistor (TFET) was introduced, where instead of using metal to induce charge plasma in the source region, cladding layer was utilized to engineer the energy bands in this region.
Journal ArticleDOI

InAs/Si Hetero-Junction Channel to Enhance the Performance of DG-TFET with Graphene Nanoribbon: an Analytical Model

TL;DR: In this article, a double-gate dual-metal tunnel field effect transistor (DG-TFET) with graphene nano-ribbon is presented, which improves the performance by incorporating group III-V material in source.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

TL;DR: By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Journal ArticleDOI

Low-Voltage Tunnel Transistors for Beyond CMOS Logic

TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.
Journal ArticleDOI

Double-Gate Tunnel FET With High- $\kappa$ Gate Dielectric

TL;DR: In this article, a double-gate tunnel field effect transistor (DG tunnel FET) with a high-kappa gate dielectric was proposed and validated using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average sub-threshold swing of 57 mV/dec, and a minimum point slope of 11 mV /dec.
Journal ArticleDOI

A theory of the electrical breakdown of solid dielectrics

TL;DR: In this paper, two distinct mechanisms have been suggested for the sudden increase of the number of electrons in an unfilled band, which occurs when the field strength passes a critical value, analogous to the electrical breakdown of gases.
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