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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

Adrian M. Ionescu, +1 more
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 329-337
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TLDR
Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Abstract
Power dissipation is a fundamental problem for nanoelectronic circuits. Scaling the supply voltage reduces the energy needed for switching, but the field-effect transistors (FETs) in today's integrated circuits require at least 60 mV of gate voltage to increase the current by one order of magnitude at room temperature. Tunnel FETs avoid this limit by using quantum-mechanical band-to-band tunnelling, rather than thermal injection, to inject charge carriers into the device channel. Tunnel FETs based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal-oxide-semiconductor (CMOS) transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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Citations
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Journal ArticleDOI

Monolayer Hexagonal Boron Nitride Tunnel Barrier Contact for Low-Power Black Phosphorus Heterojunction Tunnel Field-Effect Transistors.

TL;DR: This work reports a black phosphorus (BP) heterojunction (HJ) TFET that exhibits a record high I60 and demonstrates the influence of the tunnel barrier contact on device performance, paving the way for the development of ultrafast low-power logic circuits beyond CMOS capabilities.
Journal ArticleDOI

Modeling direct interband tunneling. II. Lower-dimensional structures

TL;DR: In this paper, the applicability of the two-band Hamiltonian and the widely used Kane analytical formula to interband tunneling along unconfined directions in nanostructures was investigated.
Journal ArticleDOI

Threshold voltage extraction in Tunnel FETs

TL;DR: In this article, two possible extrapolation-type methods to extract the threshold voltage of tunnel field effect transistors (TFETs) are proposed, which are based on defining threshold voltage as the gate voltage axis intercept of the linearly extrapolated strong conduction behavior of either CRT or H 1 functions.
Journal ArticleDOI

A new analytical drain current model of cylindrical gate silicon tunnel FET with source δ-doping

TL;DR: In this paper, a new δ-doped cylindrical gate silicon tunnel FET analytical model is developed and investigated extensively, with the aim of addressing the challenges of the conventional CG-TFET.
Journal ArticleDOI

Study of line-TFET analog performance comparing with other TFET and MOSFET architectures

TL;DR: In this paper, the Line-TFET performance is compared with MOSFET and Point TFET devices, with different architectures (FinFET, GAA:Gate-All-Around) at both room and high temperatures.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

TL;DR: By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Journal ArticleDOI

Low-Voltage Tunnel Transistors for Beyond CMOS Logic

TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.
Journal ArticleDOI

Double-Gate Tunnel FET With High- $\kappa$ Gate Dielectric

TL;DR: In this article, a double-gate tunnel field effect transistor (DG tunnel FET) with a high-kappa gate dielectric was proposed and validated using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average sub-threshold swing of 57 mV/dec, and a minimum point slope of 11 mV /dec.
Journal ArticleDOI

A theory of the electrical breakdown of solid dielectrics

TL;DR: In this paper, two distinct mechanisms have been suggested for the sudden increase of the number of electrons in an unfilled band, which occurs when the field strength passes a critical value, analogous to the electrical breakdown of gases.
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