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Journal ArticleDOI

Academic and industry research progress in germanium nanodevices

Ravi Pillarisetty
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 324-328
TLDR
Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.
Abstract
Silicon has enabled the rise of the semiconductor electronics industry, but it was not the first material used in such devices. During the 1950s, just after the birth of the transistor, solid-state devices were almost exclusively manufactured from germanium. Today, one of the key ways to improve transistor performance is to increase charge-carrier mobility within the device channel. Motivated by this, the solid-state device research community is returning to investigating the high-mobility material germanium. Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.

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Citations
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Journal ArticleDOI

A catalyst-free synthesis of germanium nanowires obtained by combined X-ray chemical vapour deposition of GeH4 and low-temperature thermal treatment techniques

TL;DR: In this paper, a catalyst-free innovative synthesis, by combined X-ray chemical vapour deposition and low-temperature thermal treatments, produced high yields of the nanoproducts with the GeH4 reactant gas.
Journal ArticleDOI

Deformation of the Interatomic Bonds in the Upper Layers of the Ge(111) Surface with c(2 × 8), 7 × 7, and 5 × 5 Structures

TL;DR: In this paper, the deformation of the interatomic bonds in the upper atomic layers of the Ge(111) surface with c(2 × 8), 7 × 7, and 5 × 5 structures is studied using ab initio calculations.
Journal ArticleDOI

Energetic degeneracy and electronic structures of germanium trimers doped with titanium

TL;DR: Total 14 electronic transitions starting from the 2A' and 2A″ states were assigned to five out of six visible bands in the experimental anion photoelectron spectrum of TiGe3 - and each band was proven to be caused by multiple one-electron detachments from two populated anionic states.

Development of Silicon Photonic Multi Chip Module Transceivers

TL;DR: The work in this dissertation is centered around the development of silicon photonic multi chip module transceivers to aid in the deployment of siliconPhotonics within data centers.
Journal ArticleDOI

Size-tunable germanium particles prepared by self-sustaining reduction of germanium oxide

TL;DR: In this article, a self-sustained reaction of GeO2 with Zn, Mg, and NaBH4 was used to synthesize highly crystalline germanium particles.
References
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Proceedings ArticleDOI

A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

TL;DR: In this article, the authors describe a novel strained transistor architecture which is incorporated into a 90nm logic technology on 300mm wafers, which features an epitaxially grown strained SiGe film embedded in the source drain regions.
Journal ArticleDOI

Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing

TL;DR: In this paper, a method of controlling threading dislocation densities in Ge on Si involving graded SiGe layers and chemical-mechanical polishing (CMP) is presented.
Journal ArticleDOI

High-k/Ge MOSFETs for future nanoelectronics

TL;DR: In this article, the opportunities and challenges of high-k/Ge MOSFETs are discussed on the basis of the material properties of Ge oxide to provide insights for future progress.
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