scispace - formally typeset
Journal ArticleDOI

Academic and industry research progress in germanium nanodevices

Ravi Pillarisetty
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 324-328
TLDR
Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.
Abstract
Silicon has enabled the rise of the semiconductor electronics industry, but it was not the first material used in such devices. During the 1950s, just after the birth of the transistor, solid-state devices were almost exclusively manufactured from germanium. Today, one of the key ways to improve transistor performance is to increase charge-carrier mobility within the device channel. Motivated by this, the solid-state device research community is returning to investigating the high-mobility material germanium. Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.

read more

Citations
More filters
Journal ArticleDOI

Improving carrier mobility of polycrystalline Ge by Sn doping.

TL;DR: The results thus demonstrate the usefulness of Sn doping of polycrystalline Ge and the importance of temperature while incorporating Sn and make it possible to fabricate advanced Ge-based devices including high-speed thin-film transistors.
Journal ArticleDOI

Atomic and electronic structure of the ferroelectric BaTiO3/Ge(001) interface

TL;DR: In this paper, a combination of density functional theory, atomic-resolution electron microscopy and in situ photoemission spectroscopy is used to investigate the electronic properties and atomic structure of the BaTiO3/Ge interface.
Journal ArticleDOI

A four-qubit germanium quantum processor

TL;DR: In this article, a four-qubit quantum processor based on hole spins in germanium quantum dots is presented, where the quantum dots are defined in a two-by-two array and obtain controllable coupling along both directions.
Journal ArticleDOI

Anelastic Behavior in GaAs Semiconductor Nanowires

TL;DR: The mechanical behavior of vertically aligned single-crystal GaAs nanowires grown on GaAs(111)B surface was investigated and anelasticity was observed, which opens up the prospect of using nanowire materials for nanoscale damping applications.
Journal ArticleDOI

Carrier mobility in strained Ge nanowires

TL;DR: In this paper, the electron and hole mobilities in Ge nanowires with diameter up to 10nm were analyzed. And they showed that the phonon-limited mobility is strongly dependent on the diameter and on the orientation of the nanowire, and is also very responsive to unaxial strains.
References
More filters
Proceedings ArticleDOI

A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

TL;DR: In this article, the authors describe a novel strained transistor architecture which is incorporated into a 90nm logic technology on 300mm wafers, which features an epitaxially grown strained SiGe film embedded in the source drain regions.
Journal ArticleDOI

Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing

TL;DR: In this paper, a method of controlling threading dislocation densities in Ge on Si involving graded SiGe layers and chemical-mechanical polishing (CMP) is presented.
Journal ArticleDOI

High-k/Ge MOSFETs for future nanoelectronics

TL;DR: In this article, the opportunities and challenges of high-k/Ge MOSFETs are discussed on the basis of the material properties of Ge oxide to provide insights for future progress.
Related Papers (5)