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Journal ArticleDOI

Academic and industry research progress in germanium nanodevices

Ravi Pillarisetty
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 324-328
TLDR
Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.
Abstract
Silicon has enabled the rise of the semiconductor electronics industry, but it was not the first material used in such devices. During the 1950s, just after the birth of the transistor, solid-state devices were almost exclusively manufactured from germanium. Today, one of the key ways to improve transistor performance is to increase charge-carrier mobility within the device channel. Motivated by this, the solid-state device research community is returning to investigating the high-mobility material germanium. Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.

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Citations
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Journal ArticleDOI

The Challenges of Developing Biosensors for Clinical Assessment: A Review

TL;DR: In this paper, a review of the challenges for the development of biosensors for clinical assessment and its broad application in multidisciplinary fields is presented, highlighting the following technologies: magnetoresistive (MR)-based, transistor-based, quartz crystal microbalance (QCM), and optical-based.
Journal ArticleDOI

Strain-Free Layered Semiconductors for 2D Transistors with On-State Current Density Exceeding 1.3 mA μm-1.

TL;DR: Strain-free 2D Bi2O2Se provides a promising material platform for studying novel quantum phenomena and exploration of high-performance low-power electronics as discussed by the authors , which enables the observation of Shubnikov-de Haas quantum oscillations and shows substantially higher (>4 times) mobility over previous in-plane 2D crystals.
Journal ArticleDOI

Ballistic electron transport calculation of strained germanium-tin fin field-effect transistors

H.-S. Lan, +1 more
TL;DR: In this paper, the dependence of ballistic electron current on Sn content, sidewall orientations, fin width, and uniaxial tensile stress is theoretically studied for the GeSn fin field effect transistors.
Dissertation

Spin dependent transport in semiconductor nanostructures

Y. Gul
TL;DR: In this paper, a series of transport experiments was conducted to investigate many body e↵ects in electrons and holes in one dimension using lithographically patterned surface gates in In0.75Ga0.25As and p-type Ge quantum wires.
Journal ArticleDOI

Structure and effects of annealing in colloidal matrix-free Ge quantum dots.

TL;DR: It is suggested that as-prepared samples are best described by the core-shell model with a small nano-crystalline core and an amorphous outer layer terminated with oxygen or hydrogen depending on the synthesis route.
References
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Proceedings ArticleDOI

A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

TL;DR: In this article, the authors describe a novel strained transistor architecture which is incorporated into a 90nm logic technology on 300mm wafers, which features an epitaxially grown strained SiGe film embedded in the source drain regions.
Journal ArticleDOI

Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing

TL;DR: In this paper, a method of controlling threading dislocation densities in Ge on Si involving graded SiGe layers and chemical-mechanical polishing (CMP) is presented.
Journal ArticleDOI

High-k/Ge MOSFETs for future nanoelectronics

TL;DR: In this article, the opportunities and challenges of high-k/Ge MOSFETs are discussed on the basis of the material properties of Ge oxide to provide insights for future progress.
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