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STMicroelectronics

CompanyGeneva, Switzerland
About: STMicroelectronics is a company organization based out in Geneva, Switzerland. It is known for research contribution in the topics: Signal & Transistor. The organization has 17172 authors who have published 29543 publications receiving 300766 citations. The organization is also known as: SGS-Thomson & STM.


Papers
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Journal ArticleDOI
TL;DR: In this article, a tensile strain was applied to a 300nm-thick GeSn layer with 5.4 at% Sn, which is an indirect-bandgap semiconductor as-grown, to transform it into a direct-band gap semiconductor that supports lasing.
Abstract: Strained GeSn alloys are promising for realizing light emitters based entirely on group IV elements. Here, we report GeSn microdisk lasers encapsulated with a SiNx stressor layer to produce tensile strain. A 300 nm-thick GeSn layer with 5.4 at% Sn, which is an indirect-bandgap semiconductor as-grown, is transformed via tensile strain engineering into a direct-bandgap semiconductor that supports lasing. In this approach, the low Sn concentration enables improved defect engineering and the tensile strain delivers a low density of states at the valence band edge, which is the light hole band. We observe ultra-low-threshold continuous-wave and pulsed lasing at temperatures up to 70 K and 100 K, respectively. Lasers operating at a wavelength of 2.5 μm have thresholds of 0.8 kW cm−2 for nanosecond pulsed optical excitation and 1.1 kW cm−2 under continuous-wave optical excitation. The results offer a path towards monolithically integrated group IV laser sources on a Si photonics platform. Continuous-wave lasing in strained GeSn alloys is reported at temperatures of up to 100 K. The approach offers a route towards a group-IV-on-silicon laser.

138 citations

Patent
Luc Wuidart1
05 Apr 2000
TL;DR: In this article, a method for determining the distance separating an electromagnetic transponder from a terminal generating a magnetic field by a first oscillating circuit, including a second oscillation circuit, upstream of a rectifying circuit adapted to providing a D.C. voltage was proposed.
Abstract: A method and apparatus for determining the distance separating an electromagnetic transponder from a terminal generating a magnetic field by a first oscillating circuit, the transponder including a second oscillating circuit, upstream of a rectifying circuit adapted to providing a D.C. voltage. The method includes storing a first information relative to the level of the D.C. voltage when the second oscillating circuit is tuned on a determined frequency; storing a second information relative to the level of the D.C. voltage after having caused a frequency detuning of the second oscillating circuit; and comparing the two stored pieces of information.

137 citations

Journal ArticleDOI
TL;DR: An overview of evolution of transistor parameters under negative bias temperature instability stress conditions commonly observed in p-MOSFETs in recent technologies is presented and a physical model is proposed which could be used to more accurately predict the transistor degradation.

136 citations

Journal ArticleDOI
TL;DR: A wide range of requests coming from customer appears to demonstrate the feasibility of the TSV for a large range of via size and via AR either for process point of view or for performances Point of view.

136 citations

Journal ArticleDOI
TL;DR: Amorphous thin solid films of lithium phosphorus oxynitride (LiPON) were prepared by radiofrequency sputtering from a Li 3 PO 4 target by varying nitrogen flow rate as mentioned in this paper.

136 citations


Authors

Showing all 17185 results

NameH-indexPapersCitations
Bharat Bhushan116127662506
Albert Polman9744542985
G. Pessina8482830807
Andrea Santangelo8388629019
Paolo Mattavelli7448219926
Daniele Ielmini6836716443
Jean-François Carpentier6245914271
Robert Henderson5844013189
Bruce B. Doris5660412366
Renato Longhi551778644
Aldo Romani5442511513
Paul Muralt5434412694
Enrico Zanoni5370513926
Gaudenzio Meneghesso5170312567
Franco Zappa502749211
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
202225
2021560
2020798
2019952
2018948
2017781